Zobrazeno 1 - 10
of 20
pro vyhledávání: '"B. E. Maile"'
Publikováno v:
Microelectronic Engineering. 30:35-40
The influence of proximity correction on device yield and process latitude in electron-beam fabrication of short-period metal-semiconductor-metal (MSM) photodetectors is investigated. A modified Fourier-transform deconvolution method is used for prox
Publikováno v:
Solid-State Electronics. 37:1001-1004
A new type of a quasi one-dimensional planar field-effect-transistor (FET) with two lateral and symmetric in-plane-gate electrodes (IPG) is realized. The vertical layer sequence consists of a GaAs/AlGaAs heterostructure and a δ-doped pseudomorphic I
Autor:
G. Weimann, H. Leier, J. Straka, B. E. Maile, Heinz Schweizer, F. E. Prins, G. Lehr, G. Mayer, Alfred Forchel
Publikováno v:
Physical Review B. 47:4060-4063
Time-resolved investigations on the photoluminescence of GaAs/${\mathrm{Al}}_{\mathit{x}}$${\mathrm{Ga}}_{1\mathrm{\ensuremath{-}}\mathit{x}}$As quantum wires as a function of the wire width and the potential well depth indicate a reduction of the en
Publikováno v:
physica status solidi (b). 159:457-470
The emission of compound semiconductor wires is investigated. Two types of structures are studied. Open wires defined by electron beam lithography and dry etching show a strong reduction of the quantum efficiency due to sidewall recombination if the
Publikováno v:
Microelectronic Engineering. 11:43-46
We have developed quantum wires with width down to 40nm using high dose Ga - implantation (2×10 14 cm -2 ) in suitably masked GaAs/GaA1As quantum well substrates. Au masks with widths between 220nm and 40nm and a height of 40nm were defined by a two
Publikováno v:
Microelectronic Engineering. 11:595-598
We have investigated the impact of dry etch sidewall damage on the optical properties of GaAs/AlGaAs quantum wires defined by high-resolution electron beam lithography. Spatially resolved cw and picosecond photoluminescence spectroscopy was used to c
Publikováno v:
Applied Physics Letters. 57:807-809
Buried GaAs/AlGaAs quantum wires were prepared by Al0.2Ga0.8As overgrowth of deep etched wires defined by high‐resolution electron beam lithography and dry etching. The overgrown wires show a dramatic decrease of the optically inactive sidewall lay
Publikováno v:
Applied Physics Letters. 56:2016-2018
We have investigated the sidewall recombination in dry‐etched GaAs/GaAlAs wires with widths between 12 μm and 300 nm using picosecond spectroscopy. The wires were fabricated with electron beam lithography and different reactive ion etching process
Publikováno v:
Applied Physics Letters. 56:48-50
We have fabricated GaAs/GaAlAs quantum wires with widths between 220 and 40 nm by high‐dose (2×1014 cm−2) Ga implantation in a locally masked single quantum well structure. The width dependence of the emission energies indicates a steep 1D confi
Publikováno v:
Extended Abstracts of the 1992 International Conference on Solid State Devices and Materials.