Zobrazeno 1 - 1
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pro vyhledávání: '"B. E. Fischel"'
Autor:
K. E. Krohn, M. F. Lemon, L. Brubaker, Robert Clayton Wheland, Hoang Vi Tran, D. Hardy, S. J. McLain, Mureo Kaku, O. Nagao, Roger H. French, Douglas J. Adelman, Jerald Feldman, Charles Y. Chen, Vladimir Liberman, Michael T. Mocella, B. E. Fischel, Min K. Yang, A. L. Shoe, B. Fones, Weiming Qiu
Publikováno v:
SPIE Proceedings.
To identify the most practical and cost-effective technology after water immersion lithography (Gen1) for sub-45 nm half pitches, the semiconductor industry continues to debate the relative merits of water double patterning (feasible, but high cost o