Zobrazeno 1 - 10
of 105
pro vyhledávání: '"B. Bullemer"'
Autor:
H Pfleiderer, B Bullemer
Publikováno v:
Solar Energy Materials and Solar Cells. 53:131-152
The field in the i-layer of an amorphous-silicon solar cell may be assumed as uniform. We formulate the respective cell model without further approximations in terms of a “regional method”. The i-layer is subdivided for that purpose in many regio
Publikováno v:
Surface Review and Letters. :21-25
Large unit cells of dimer-adatom-stacking-fault structure and related 2 × 2 and c(4 × 2) reconstructions have been prepared by low-temperature solid-phase epitaxy and observed by scanning tunneling microscopy. The size-different unit cells of the D
Publikováno v:
Surface Science. 382:L658-L665
The atomic structure of SiC(0001)C surface of the 6H polytype has been studied in UHV by scanning tunnelling microscopy, low energy electron diffraction and Auger electron spectroscopy. A number of different reconstructions could be reproducibly prep
Publikováno v:
Surface Science. 375:195-202
Large unit cells of dimer-adatom-stacking-fault (DAS) structure and related (2 × 2) and c(4 × 2) reconstructions have been prepared by low temperature solid phase epitaxy and observed by scanning tunnelling microscopy. The development of larger uni
Publikováno v:
Surface Science. 376:L414-L418
A simple method of cooling rate determination of Si samples in a radiative quench is presented. The method relies on monitoring of the LEED pattern of the Si(111) sample during quench and exact determination of the onset of the 1 × 1 – 7 × 7 phas
Publikováno v:
Thin Solid Films. 294:88-92
Solid-phase epitaxy has been performed on Si(100) and Si(111) surfaces at substrate temperatures in the range of 350–650 °C and for film thickness up to a few monolayers. The features of the epitaxial films were acquired by scanning tunnelling mic
Publikováno v:
Applied Surface Science. 103:443-449
Scanning tunnelling microscopy is used to study the structure of the B Si(100) surface at low boron coverage, the surface being prepared by high-temperature annealing of heavily B-doped Si(100) samples. The surface reproducibly shows features which a
Publikováno v:
Surface Science. 369:L131-L135
New features of the C-type defects on the Si(100) surface have been found by a scanning tunnelling microscope. The depressions of these defects appear to be surface vacancies. Two protrusions of most C-type defects are actually not equal and the smal
Publikováno v:
Surface Science. 369:69-75
c(4 × 4) reconstructions have been prepared by 600°C annealing a number of different Si(100) surfaces upon which about one monolayer thick Si films had been deposited at several temperatures. Nucleation, extension and disappearance of these structu
Publikováno v:
Surface Science. :358-363
Si(111)√3 × √3-B surface phase has been formed by high-temperature annealing of B-doped Si samples. Low-energy electron diffraction observations have revealed that the Si(111)√3 × √3-B surface phase is very stable with respect to heating an