Zobrazeno 1 - 10
of 155
pro vyhledávání: '"B L, WILLIAMS"'
Autor:
M. A. Zouache, B. T. Richards, C. M. Pappas, R. A. Anstadt, J. Liu, T. Corsetti, S. Matthews, N. A. Seager, S. Schmitz-Valckenberg, M. Fleckenstein, W. C. Hubbard, J. Thomas, J. L. Hageman, B. L. Williams, G. S. Hageman
Publikováno v:
Nature Communications, Vol 15, Iss 1, Pp 1-17 (2024)
Abstract Dysregulation of the alternative pathway (AP) of the complement system is a significant contributor to age-related macular degeneration (AMD), a primary cause of irreversible vision loss worldwide. Here, we assess the contribution of the liv
Externí odkaz:
https://doaj.org/article/5509274071cb4770a0b493d6e99eb582
Autor:
K. Sharma, B. L. Williams, A. Mittal, H. C. M. Knoops, B. J. Kniknie, N. J. Bakker, W. M. M. Kessels, R. E. I. Schropp, M. Creatore
Publikováno v:
International Journal of Photoenergy, Vol 2020 (2020)
Externí odkaz:
https://doaj.org/article/fa4ce4d451f440a882b4ee7171b07f47
Autor:
K. Sharma, B. L. Williams, A. Mittal, H. C. M. Knoops, B. J. Kniknie, N. J. Bakker, W. M. M. Kessels, R. E. I. Schropp, M. Creatore
Publikováno v:
International Journal of Photoenergy, Vol 2015 (2015)
Externí odkaz:
https://doaj.org/article/7d564b23a46249b29dc16a685d6ea3a5
Autor:
K. Sharma, B. L. Williams, A. Mittal, H. C. M. Knoops, B. J. Kniknie, N. J. Bakker, W. M. M. Kessels, R. E. I. Schropp, M. Creatore
Publikováno v:
International Journal of Photoenergy, Vol 2014 (2014)
Aluminium-doped zinc oxide (ZnO:Al) grown by expanding thermal plasma chemical vapour deposition (ETP-CVD) has demonstrated excellent electrical and optical properties, which make it an attractive candidate as a transparent conductive oxide for photo
Externí odkaz:
https://doaj.org/article/31a6ae990c5d4fdba4c4f66e23b71afa
Autor:
M. G. Ramsay, Steven James, P. Allan, C. R. D. Brown, L. M. R. Hobbs, Oliver Humphries, Sam Vinko, B. L. Williams, M. P. Hill, David Hoarty
Publikováno v:
Communications Physics, Vol 3, Iss 1, Pp 1-6 (2020)
Understanding the evolution of extreme states of matter driven by relativistic laser-plasma interactions is a fundamental problem in high-field physics. This is especially true for nanostructured targets, where hydrodynamic effects play a key role wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::43fc649666148b9c574a0280009084a5
https://doi.org/10.1038/s42005-020-00438-7
https://doi.org/10.1038/s42005-020-00438-7
Autor:
Saurabh Karwal, B. L. Williams, Wilhelmus M. M. Kessels, T. Faraz, Mariadriana Creatore, Marcel A. Verheijen
Publikováno v:
Journal of Materials Chemistry C, 6(15), 3917-3926. Royal Society of Chemistry
Plasma-assisted atomic layer deposition (ALD) of HfNx thin films using tris(dimethylamino)cyclopentadienylhafnium [CpHf(NMe2)3] as the Hf precursor and H2 plasma as the reducing co-reactant is reported. We previously concluded that the HfNx films pre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bbb19dba28b24b479f6a11cb28c5964d
https://doi.org/10.1039/C7TC05961B
https://doi.org/10.1039/C7TC05961B
Autor:
Marcel A. Verheijen, Valerio Zardetto, B. L. Williams, Mariadriana Creatore, Alberto Perrotta, Wilhelmus M. M. Kessels, Ronn Andriessen, F. Di Giacomo
Publikováno v:
Sustainable Energy & Fuels, 1(1), 30-55. Royal Society of Chemistry
Atomic layer deposition is widely acknowledged as a powerful technique for the deposition of high quality layers for several applications including photovoltaics (PV). The capability of ALD to generate dense, conformal, virtually pinhole-free layers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e18231757d737d0728ac4f422308a675
https://doi.org/10.1039/c6se00076b
https://doi.org/10.1039/c6se00076b
Autor:
Marcel A. Verheijen, Janne-Petteri Niemelä, Mariadriana Creatore, Saurabh Karwal, B. L. Williams, Wilhelmus Mathijs Marie Kessels
Publikováno v:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 35(1):01B129, 1-8. AVS Science and Technology Society
The authors synthesized HfNx (x ≥ 1) thin films by plasma-assisted atomic layer deposition at stage temperatures of 350–450 °C by using the high-thermal-stability CpHf(NMe2)3 monomer as Hf precursor and either H2 plasma or N2 plasma as coreactan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2fd76c9065f3a52187133840e349a4e
https://research.tue.nl/en/publications/753e5c7d-a9c4-4de7-98a2-6c1086c37acf
https://research.tue.nl/en/publications/753e5c7d-a9c4-4de7-98a2-6c1086c37acf
Autor:
N. J. Bakker, A. Mittal, B. Kniknie, Ruud E. I. Schropp, Wilhelmus M. M. Kessels, K. Sharma, B. L. Williams, Harm C. M. Knoops, Mariadriana Creatore
Publikováno v:
International Journal of Photoenergy, Vol 2020 (2020)
In the article titled “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells” [1], there was an error in the references list, as reference number 4 cited a wrong author’s name (M. Jean) instead of Jonas Lahne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::68e24d700a4c223c1a62886481d28f1d
https://doi.org/10.1155/2020/1215032
https://doi.org/10.1155/2020/1215032
