Zobrazeno 1 - 10
of 36
pro vyhledávání: '"B L, Halpern"'
Autor:
X.W. Wang, Takashi Tamagawa, G.J. Cui, Yasutaka Takahashi, Tso-Ping Ma, B. L. Halpern, J. J. Schmitt
Publikováno v:
Materials Science Forum. :865-868
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46750aec988de94ce737b6f9ff260330
https://doi.org/10.4028/www.scientific.net/msf.264-268.865
https://doi.org/10.4028/www.scientific.net/msf.264-268.865
Publikováno v:
Journal of Applied Physics. 79:8507-8511
The properties of interface traps in metal–silicon nitride (deposited by jet vapor deposition technique) –silicon (MNS) capacitors have been studied in some detail. In comparison with those in metal–oxide–Si capacitors, the interface traps in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba597b31db9b01944da98d548419d154
https://doi.org/10.1063/1.362529
https://doi.org/10.1063/1.362529
Publikováno v:
Journal of Electronic Materials. 23:1239-1244
The optical and electronic properties of organic molecules suggest application in hybrid optical-electronic integrated circuits and thin film devices, but pure, high quality, organic solid films are difficult to make. A better approach is to trap org
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e205f255df91c4b5c57ea794f0dd29e3
https://doi.org/10.1007/bf02649976
https://doi.org/10.1007/bf02649976
Autor:
B. L. Halpern, J. J. Schmitt
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:1623-1627
We describe the physical basis of Jet Vapor Deposition (JVD), in which sonic, inert gas ‘‘jets in low vacuum’’ are used as vapor sources for depositing films. A ‘‘multiple jet, moving substrate’’ strategy enables deposition of a wide
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70dbc4da7360445a7e4b1965d3c786eb
https://doi.org/10.1116/1.579025
https://doi.org/10.1116/1.579025
Autor:
B. L. Halpern, J.-Z. Zhang, Haydn N. G. Wadley, L.M. Hsiung, D.C. McIntyre, J.W. Golz, J. J. Schmitt
Publikováno v:
Scripta Metallurgica et Materialia. 29:293-298
Recently, the authors have fabricated aluminum-aluminum oxide (presumably Al[sub 2]O[sub 3]) nanoscale laminates using the novel Jet Vapor Deposition (JVD) process. The JVD process is of interest because it uses high speed (He) gas jets in low vacuum
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b47f42cddfbd8ed5ac4e50a73c745af
https://doi.org/10.1016/0956-716x(93)90502-j
https://doi.org/10.1016/0956-716x(93)90502-j
Publisher Summary Jet Vapor DepositionTM (JVDTM) uses high-speed inert gas jets to carry film components to substrates. JVD has been applied to a wide range of thin and thick film applications, demonstrating an adaptability to new problems, and a ver
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::136b24013f59184f18f0dc5104e6cecb
https://doi.org/10.1016/b978-0-8155-2031-3.00018-1
https://doi.org/10.1016/b978-0-8155-2031-3.00018-1
Publikováno v:
Integrated Ferroelectrics. 2:221-229
Lead-zirconate-titanate thin films were successfully codeposited in a modest vacuum environment using a novel Gas Jet Deposition (GJD) process. The GJD process utilizes supersonic carrier gas jets to efficiently transfer the depositing species to sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bee6d122651cbb0862af8bb7848c5a5c
https://doi.org/10.1080/10584589208215745
https://doi.org/10.1080/10584589208215745
Publikováno v:
Applied Surface Science. :19-26
A novel approach to thin film deposition is presented, which combines supersonic gas jets with fast flow techniques for the “gas jet deposition” (GJD) of metal, semiconductor, oxide, nitride, and organic thin films. The vapor sources are superson
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a33b0bf5af263f44e8a92012ca05827a
https://doi.org/10.1016/0169-4332(91)90302-z
https://doi.org/10.1016/0169-4332(91)90302-z
Publikováno v:
Second-Generation HTS Conductors ISBN: 1402081170
Jet Vapor Deposition holds much promise for high rate, low cost manufacture of HTS tape. At low rates, JVD has proven its ability to deposit multicomponent oxides such as the ferrites and ferroelectrics, as well as HTS buffer layers and sandwiches of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::baa447b7fa518b98ec9fd3b7fd918ae3
https://doi.org/10.1007/0-387-25839-6_13
https://doi.org/10.1007/0-387-25839-6_13
Publikováno v:
Applied Physics Letters. 71:3418-3420
We have fabricated, using Jet Vapor Deposition, films of Pb doped rare-earth perovskite Mn oxides which show colossal magnetoresistance (CMR) effect. We have achieved epitaxial CMR films at a high deposition rate of typically 0.3 nm/s, uniformly over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf26e2d46d2460203a30f4e4c3f811a1
https://doi.org/10.1063/1.120353
https://doi.org/10.1063/1.120353