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pro vyhledávání: '"Ayuta Suzuki"'
Autor:
Ayuta Suzuki, Atsushi Okuyama, Takayuki Toshima, Kenji Nishi, Yoshiya Hagimoto, Hayato Iwamoto, Suguru Saito
Publikováno v:
Solid State Phenomena. 219:115-118
The microminiaturization of semiconductor devices has made it necessary to control the wet etching process on the nanometer order. It is therefore extremely important to understand wet etching reactions in the nanoscale region of solid-liquid interfa
Publikováno v:
Journal of Vacuum Science & Technology A. 37:020920
In this study, a surface oxidation model for the plasma enhanced atomic layer deposition process for silicon oxide films formed by the combination of aminosilane with Ar/O2 plasma is proposed. After the discussion of the dominant oxidation pathways i
Autor:
Shunsuke Kimura, Kosuke Ota, Masahiko Hasumi, Ayuta Suzuki, Mitsuru Ushijima, Toshiyuki Sameshima
Publikováno v:
ECS Meeting Abstracts. :2118-2118
1.Introduction Crystallization of amorphous silicon (a-Si) thin films is important for fabricating thin film transistor (TFTs) and thin film solar cells [1]. Rapid heating is an attractive method with low thermal budget for fabricating these devices
Publikováno v:
The Proceedings of the Thermal Engineering Conference. 2011:217-218