Zobrazeno 1 - 10 of 10 pro vyhledávání: '"Ayako Kawanishi"'
1
Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process
Autor: Yuriko Seino, Hironobu Sato, Ayako Kawanishi, Masahiro Kanno, Tsukasa Azuma, Hirokazu Kato, Katsutoshi Kobayashi, Hiroki Yonemitsu
Publikováno v: Electronics and Communications in Japan. 98:59-64
SUMMARY Directed self-assembly (DSA) lithography has recently entered the spotlight as one of the most promising new generation lithography candidates, with the potential for fabrication of semiconductor device patterns down to sub-30 nm. In this rep
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9299bbe5aa66e1953c3ce4909165c40
https://doi.org/10.1002/ecj.11691
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3
Sub-30nm via interconnects fabricated using directed self-assembly
Autor: Naofumi Nakamura, Hirokazu Kato, Hironobu Sato, Katsutoshi Kobayashi, Tsubasa Imamura, Yuriko Seino, Hiroki Yonemitsu, Ayako Kawanishi, Masahiro Kanno, Tsukasa Azuma, Mitsuhiro Omura
Publikováno v: Microelectronic Engineering. 110:152-155
In this study, sub-30nm via interconnects were fabricated and fully integrated on a 300mm wafer using directed self-assembly lithography (DSAL). They were tested electrically and initial test results are reported. DSAL was applied on the via layer, w
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::53f5115333b82736bdf8c8690bb59dde
https://doi.org/10.1016/j.mee.2013.03.025
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5
Purification of a Serine Protease ofVibrio parahaemolyticusand Its Characterization
Autor: Masami Ishihara, Shin Ichi Miyoshi, Hirofumi Watanabe, Ken Ichi Tomochika, Sumio Shinoda, Ayako Kawanishi
Publikováno v: Microbiology and Immunology. 46:299-303
A 50 kDa protease designated as VPP1 was purified from the culture supernatant of a clinical strain of Vibrio parahaemolyticus by ammonium sulfate fractionation, Sephacryl S-200 HR gel filtration and Fractogel EMD TMAE 650 ion-exchange chromatography
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5945673aca97b21161271f24f6aa910
https://doi.org/10.1111/j.1348-0421.2002.tb02699.x
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6
Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly
Autor: Katsutoshi Kobayashi, Katsuyoshi Kodera, Hirokazu Kato, Masahiro Kanno, Ayako Kawanishi, Hiroki Yonemitsu, Yuriko Seino, Hironobu Sato, Tsukasa Azuma
Publikováno v: Alternative Lithographic Technologies V.
Dissipative particle dynamics (DPD) simulations are utilized to optimize contact hole shrink process using graphoepitaxial directed self-assembly (DSA). In this work, poly (styrene-block-methyl methacrylate) (PS-b-PMMA) was employed. In the contact h
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a11543117b96cc552c027faf11e06ab1
https://doi.org/10.1117/12.2009622
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7
Contact hole shrink process using directed self-assembly
Autor: Takahiro Kitano, Hiroki Yonemitsu, Yuriko Seino, Takayuki Toshima, Katsutoshi Kobayashi, Seiji Nagahara, Hironobu Sato, Makoto Muramatsu, Tsukasa Azuma, Ayako Kawanishi, Hikazu Kato, Masahiro Kanno
Publikováno v: Alternative Lithographic Technologies IV.
We report on a contact hole shrink process using directed self-assembly. A diblock copolymer, poly (styrene-blockmethyl methacrylate) (PS-b-PMMA), is used to shrink contact holes. Contact hole guide patterns for graphoepitaxy are formed by ArF photor
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8592a1b51ba003c787822f9337291b76
https://doi.org/10.1117/12.915652
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8
Experimental Extraction of Linear Disturbance in a Two-Dimensional Turbulent Jet and Comparison to a Linear Stability Theory
Autor: Masaharu Matsubara, Shun Tazoe, Ayako Kawanishi
Publikováno v: ASME-JSME-KSME 2011 Joint Fluids Engineering Conference: Volume 1, Symposia – Parts A, B, C, and D.
In a two-dimensional turbulent jet, there exists a lateral vibration of the high-speed jet core. In the present study, a periodic initial disturbance is introduced into fully developed turbulent jet from a slot mounted at a duct exit in order to cont
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::878a3a47785abf4a294489f199b8b4c7
https://doi.org/10.1115/ajk2011-16028
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9
Contact hole shrink process using graphoepitaxial directed self-assembly lithography
Autor: Hirokazu Kato, Yuriko Seino, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Seiji Nagahara, Hironobu Sato, Makoto Muramatsu, Tsukasa Azuma, Takayuki Toshima, Hiroki Yonemitsu, Takahiro Kitano
Publikováno v: Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:033011
A contact hole shrink process using directed self-assembly lithography (DSAL) for sub-30 nm contact hole patterning is reported on. DSAL using graphoepitaxy and poly (styrene-block-methyl methacry- late) (PS-b-PMMA) a block copolymer (BCP) was demons
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bc7a2e70ec1a6b1e620b52255cc3a11f
https://doi.org/10.1117/1.jmm.12.3.033011
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