Experimental realization of Bloch oscillations in a parity-time synthetic silicon photonic lattice

Autor: Ye-Long Xu, William S. Fegadolli, Lin Gan, Ming-Hui Lu, Xiao-Ping Liu, Zhi-Yuan Li, Axel Scherer, Yan-Feng Chen

Publikováno v: Nature Communications, Vol 7, Iss 1, Pp 1-6 (2016)

Bloch oscillations are a fundamental electron transport phenomenon in condensed matter. Here, the authors experimentally realize spatial Bloch oscillations in a non-Hermitian integrated photonic system using CMOS compatible fabrication processes, con

Externí odkaz: https://doaj.org/article/60b9af5b03db47f5838a4a932a693e4f

Fabrication of Patterned Integrated Electrochemical Sensors

Autor: Muhammad Mujeeb-U-Rahman, Dvin Adalian, Axel Scherer

Publikováno v: Journal of Nanotechnology, Vol 2015 (2015)

Fabrication of integrated electrochemical sensors is an important step towards realizing fully integrated and truly wireless platforms for many local, real-time sensing applications. Micro/nanoscale patterning of small area electrochemical sensor sur

Externí odkaz: https://doaj.org/article/54addecd1162414fbbc6ab452bdac2b1

Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography

Autor: Scott M. Lewis, Hayden R. Alty, Michaela Vockenhuber, Guy A. Derose, Dimitrios Kazazis, Grigore A. Timco, James A. Mann, Paul Winpenny, Axel Scherer, Yasin Ekinci, Richard E. Winpenny

Publikováno v: Advances in Patterning Materials and Processes XL.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b5d039c471bae3147b4d1180d6b55d04
https://doi.org/10.1117/12.2658324

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Autor: Scott M. Lewis, Guy A. DeRose, Hayden R. Alty, Matthew S. Hunt, Nathan Lee, James A. Mann, Richard Grindell, Alex Wertheim, Lucia De Rose, Antonio Fernandez, Christopher A. Muryn, George F. S. Whitehead, Grigore A. Timco, Axel Scherer, Richard E. P. Winpenny

Publikováno v: Antonio Fernandez Mato
Lewis, S M, DeRose, G A, Alty, H R, Hunt, M S, Lee, N, Mann, J A, Grindell, R, Wertheim, A, De Rose, L, Fernandez, A, Muryn, C A, Whitehead, G F S, Timco, G A, Scherer, A & Winpenny, R E P 2022, ' Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography ', Advanced Functional Materials, vol. 32, no. 32, 2202710 . https://doi.org/10.1002/adfm.202202710

A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44d4c67f71d03b797d4b219a30c11339
https://resolver.caltech.edu/CaltechAUTHORS:20220718-951245300

Development of a Compact and Robust Mid-Infrared Spectrometer by Using a Silicon/Air Hyperspectral Filter

Autor: Taeyoon Jeon, Amirhossein Nateghi, William Max Jones, Changsoon Choi, Juan Pablo Cardenas, Charles Ross, Axel Scherer

The molecular absorption spectrum in the mid-infrared (mid-IR) region is typically measured by Fourier-transform infrared spectroscopy (FTIR). Such spectrometers require complex and delicately aligned interferometers, which increases their size and c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb89ffa9bfa4bb56e5a21a34e591fe5e
https://resolver.caltech.edu/CaltechAUTHORS:20220113-245902396