Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Avraham Ver"'
Autor:
Jie Li, Holger Schroder, Sanjay Yedur, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, John Piggot, Babak Khamsepour, Avraham Ver, Zhuan Liu, Jiangtao Hu
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Reducing parameter correlations to enhance scatterometry measurement accuracy, precision and tool matching is a crucial component of every modeling effort. Parameter sensitivity can largely depend on the orientation of the plane of incidence relative
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9667b371c3e658e03a2406839488b8ba
https://doi.org/10.1117/12.2046165
https://doi.org/10.1117/12.2046165
Autor:
Xi Zou, Zhuan Liu, Jiangtao Hu, Jie Li, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, Avraham Ver, Sanjay Yedur, Babak Khamsepour, Robert A. Cohen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Optical critical dimension (OCD) metrology using scatterometry has been widely adopted for fast and non-destructive in-line process control and yield improvement. Recently there has been increased interest in metrology performance enhancement through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::998b02afef05813f42f720ea0cbb4900
https://doi.org/10.1117/12.2046639
https://doi.org/10.1117/12.2046639
Autor:
Jie Li, Sanjay Yedur, Avraham Ver, Zhuan Liu, Peter Wilkens, Robert Cohen, Holger Schroder, Babak Khamsehpour, Jiangtao Hu, John Piggot, Karthik Boinapally, Shahin Zangooie, Xi Zou
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:041406
Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52911669e0ecd0599da9478493be47fd
https://doi.org/10.1117/1.jmm.13.4.041406
https://doi.org/10.1117/1.jmm.13.4.041406