Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Aurelien Labrosse"'
Autor:
Florian Pinzan, Julien Baderot, Y Zimmermann, Aurelien Labrosse, Sergio Martinez, Guilhem Bernard, Johann Foucher, Hanna Grönqvist, Alexandre Dervillé
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXI.
The development and integration of new materials and structures at the nanoscale require multiple parallel characterizations in order to control mostly physico-chemical properties as a function of applications. Among all properties, we can list physi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e695d3e3d2dc218cab3fd503b0a4a25d
https://doi.org/10.1117/12.2258093
https://doi.org/10.1117/12.2258093
Autor:
Hanna Grönqvist, Johann Foucher, Sergio Martinez, Alexandre Dervillé, Julien Baderot, Guilhem Bernard, Aurelien Labrosse, Y Zimmermann
Publikováno v:
SPIE Proceedings.
We introduce a set of designed tools for the analysis of lithography patterns and nano structures. The classical metrological analysis of these objects has the drawbacks of being time consuming, requiring manual tuning and lacking robustness and user
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5f44a5bfa045e07374e54d657078cd8
https://doi.org/10.1117/12.2258612
https://doi.org/10.1117/12.2258612
Autor:
Sandip Halder, Johann Foucher, Roel Gronheid, Carolien Boeckx, Y Zimmermann, Philippe Leray, A. Dervilllé, Aurelien Labrosse, Arjun Singh
Publikováno v:
SPIE Proceedings.
The dimensional scaling in IC manufacturing strongly drives the demands on CD and defect metrology techniques and their measurement uncertainties. Defect review has become as important as CD metrology and both of them create a new metrology paradigm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ba539923cd54a8fd7c6e606a78e0d14
https://doi.org/10.1117/12.2219378
https://doi.org/10.1117/12.2219378
Autor:
Aurelien Labrosse, Johann Foucher, Sebastian W. Schmidt, Sebastian Schade, Sandra Bos, Bernd Irmer, Alexandre Dervillé
Publikováno v:
SPIE Proceedings.
In this paper, we present our most recent approach on the extraction of reliable atomic force microscopy (AFM) tip dimensions from scanning electron microscopy (SEM) images in order to answer future requirements on ever shrinking CD AFM tips. We demo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd79f1e6294989e62ad11f4aa3e5b92e
https://doi.org/10.1117/12.2085977
https://doi.org/10.1117/12.2085977