Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Aurelien Botman"'
Autor:
Tresa M. Pollock, McLean P. Echlin, Aurelien Botman, Remco Geurts, Steven Randolph, James Lamb, Andrew T. Polonsky
Publikováno v:
JOM. 73:4258-4269
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59fcf6cdc58c17040664d7d00d608fa0
https://doi.org/10.1007/s11837-021-04919-0
https://doi.org/10.1007/s11837-021-04919-0
Autor:
James Lamb, McLean Echlin, Andrew Polonsky, Remco Geurts, Kira Pusch, Evan Raeker, Aurelien Botman, Chris Torbet, Tresa Pollock
Publikováno v:
Microscopy and Microanalysis. 28:862-863
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4029508ae62505f771cf474452b7632
https://doi.org/10.1017/s1431927622003828
https://doi.org/10.1017/s1431927622003828
Autor:
Cedric Bouchet-Marquis, Xiaolin Nan, Steven Randolph, Aurelien Botman, Marcus Straw, Jenna Schardt, Jing Wang, Chad Rue, Qian Wu
Publikováno v:
Scientific Reports
Scientific Reports, Vol 11, Iss 1, Pp 1-15 (2021)
Scientific Reports, Vol 11, Iss 1, Pp 1-15 (2021)
Correlative light and electron microscopy (CLEM) is a powerful tool for defining the ultrastructural context of molecularly-labeled biological specimens, particularly when superresolution fluorescence microscopy (SRM) is used for CLEM. Current CLEM,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::319c16f38dbbbb0a2c8bcfd324372f95
https://doi.org/10.1038/s41598-021-92608-y
https://doi.org/10.1038/s41598-021-92608-y
Publikováno v:
Nanotechnology. 31(42)
Nickel nanostructures have found widespread application as both functional components, e.g. in magnetic systems, and as part of the lithographic pattern transfer process as etch masks, EUV mask absorbers, and imprint templates. Electron-beam induced
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::051928f29cec9df80c549dddc1f1e0bb
https://pubmed.ncbi.nlm.nih.gov/32580183
https://pubmed.ncbi.nlm.nih.gov/32580183
Autor:
Andrew T. Polonsky, Steven Randolph, McLean P. Echlin, Jorge Filevich, Marcus Straw, Chris J. Torbet, Michael S. Titus, Tresa M. Pollock, Aurelien Botman, Alessandro Mottura, W. C. Lenthe, Remco Geurts, Toby Francis
Publikováno v:
Microscopy and Microanalysis. 26:2624-2625
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b837eaef8b2682df20fef7033a011258
https://doi.org/10.1017/s1431927620022229
https://doi.org/10.1017/s1431927620022229
Autor:
Milos Toth, Jorge Filevich, Igor Aharonovich, Steven Randolph, Aiden A. Martin, Aurelien Botman, Marcus Straw
Publikováno v:
ACS applied materialsinterfaces. 9(45)
© 2017 American Chemical Society. Ultra-nanocrystalline diamond (UNCD) is increasingly being used in the fabrication of devices and coatings due to its excellent tribological properties, corrosion resistance, and biocompatibility. Here, we study its
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32c43229c5fdf73de45d8141bc06d294
https://pubmed.ncbi.nlm.nih.gov/29058873
https://pubmed.ncbi.nlm.nih.gov/29058873
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06JB01
The authors have developed a system combining a 220 fs pulse focused laser beam operating at 1030 or 515 nm, a Xe+ plasma source focused ion beam, and a Schottky source focused electron beam, all coincident at the sample. They present on results and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a61539318300cbb0536b935dc630410
https://doi.org/10.1116/1.5047806
https://doi.org/10.1116/1.5047806
Publikováno v:
Delft University of Technology
Electron-beam-induced deposition allows the creation of three-dimensional nanodevices within a scanning electron microscope. Typically the dimensions of the fabricated structure are from 20 nm to several micrometers. Until now the record for the smal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ba3bd5d298bae1c0cdd51a56dfc2c253
https://doi.org/10.1021/nl900717r
https://doi.org/10.1021/nl900717r
Publikováno v:
Journal of Vacuum Science & Technology B, 26 (6), 2008
Electron-beam-induced deposition of platinum from methylcyclopentadienyl-platinum-trimethyl was performed with a focused electron beam at low landing energies, down to 10?eV. The deposition growth rate is maximal at 140?eV, with the process being ove
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::43cd413a97670e37dab50c517b5ec92b
https://doi.org/10.1116/1.2976576
https://doi.org/10.1116/1.2976576
Publikováno v:
Microelectronic Engineering. 85:1139-1142
Electron-beam-induced deposition (EBID) allows nano-scale three-dimensional rapid prototyping and is a promising nano-lithography alternative. One application is to write conductive lines at a position chosen by the scanning electron microscope (SEM)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1aee47df3ed60ff4df45cc04ace9a7b
https://doi.org/10.1016/j.mee.2007.12.036
https://doi.org/10.1016/j.mee.2007.12.036