Zobrazeno 1 - 10 of 52 pro vyhledávání: '"Aurélie Girard"'
1
Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching
Autor: Aurélie Girard, Neal Fairley, Rim Ettouri, Remi Dussart, Bertrand Boutaud, Philippe Lefaucheux, Vincent Fernandez, Thomas Tillocher, Christophe Cardinaud
Publikováno v: Surface and Interface Analysis
Surface and Interface Analysis, Wiley-Blackwell, 2021, pp.110508. ⟨10.1002/sia.7030⟩
International audience; Plasma etching techniques can result in damage and contamination of materials, which, if not removed, can interfere with further processing. Therefore, characterisation of the etched surface is necessary to understand the basi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cdec3c08546f2ddbafb1a960a5edbf82
https://doi.org/10.1002/sia.7030
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2
Akademický článek
A long-lasting gel-based diffuser of feline pheromone can help reduce undesirable behaviors in cats at home: comparison with an electric diffuser
Autor: Gemma Espuña, Céline S. Nicolas, Aurélie Girardin, Jaume Fatjó, Jonathan Bowen, Patricia Monginoux, Christophe A. Rème
Publikováno v: Frontiers in Veterinary Science, Vol 11 (2024)
Using pheromone diffusers is part of the strategy to control stress-related behaviors in cats (Felis catus). The goal of the study was to compare the efficacy of a novel long-acting, unpowered gel-based diffuser containing a facial pheromone analog (
Externí odkaz: https://doaj.org/article/7f5e02309d804a4295db296c4cb2103d
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3
Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6/Ar plasmas
Autor: Emeline Baudet, Christophe Cardinaud, Guillaume Le Dain, Virginie Nazabal, Thibaut Meyer, Ahmed Rhallabi, Aurélie Girard, Petr Němec
Publikováno v: Applied Surface Science
Applied Surface Science, Elsevier, 2021, 549, pp.149192. ⟨10.1016/j.apsusc.2021.149192⟩
Applied Surface Science, 2021, 549, pp.149192. ⟨10.1016/j.apsusc.2021.149192⟩
International audience; A functional waveguide for photonic applications must fulfil some specific requirements in terms of dimension, shape, etch rate and roughness. In this study, Ge-Sb-Se thin films were etched using an Inductively Coupled Plasma
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::473dd7e1b85cd4be5243340f0cd54604
https://hal.archives-ouvertes.fr/hal-03194243/file/ASS_Meyer_2021-1.pdf
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4
Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas
Autor: François Boulard, Aurélie Girard, Wilfrid Faider, Christophe Cardinaud, Jordan Piet
Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2020, 38 (5), pp.053005. ⟨10.1116/6.0000397⟩
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2020, 38 (5), pp.053005. ⟨10.1116/6.0000397⟩
International audience; ABSTRACTOur interest in introducing oxygen and/or nitrogen atoms in CH4/H2/Ar plasma mixtures by means of organic precursors in the place of CH4 or by partly substituting O2 or N2O for H2 and thereby controlling carbon deposit
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::14712667385fa1ce00a17033e8ee7b6c
https://hal.archives-ouvertes.fr/hal-03010318/file/JVA20-AR-COBURN2020-00284-1.pdf
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5
Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma
Autor: Ahmed Rhallabi, Stéphane Guilet, Feriel Laourine, Aurélie Girard, Guillaume Le Dain, Thierry Czerwiec, Gérard Henrion, Cédric Noël, Christophe Cardinaud, G. Marcos
Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2021, 30 (9), pp.095022. ⟨10.1088/1361-6595/ac1714⟩
Dry etching process of iron, chromium and iron-chromium alloys under a chlorine-based plasma is studied. The objective is to create new surface functionalities. Our approach is twofold: on the one hand, an experimental study in an ICP (Inductively Co
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::777268473a385e1819441298e30cccd3
https://doi.org/10.1088/1361-6595/ac1714
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7
The role of physisorption in the cryogenic etching process of silicon
Autor: P. Lefaucheux, Aurélie Girard, T. Tillocher, S. Tahara, Christophe Cardinaud, G. Antoun, Remi Dussart, Kaoru Maekawa, J. Faguet, K. Yatsuda, K. Yamazaki
Publikováno v: Japanese Journal of Applied Physics
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SEEB03. ⟨10.7567/1347-4065/ab1639⟩
International audience
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::78862ff00f94693581891052130ed8be
https://hal.archives-ouvertes.fr/hal-02139391
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8
Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O2 plasmas
Autor: Ahmed Rhallabi, Petr Němec, Christophe Cardinaud, T Meyer, G Ledain, Aurélie Girard, Virginie Nazabal, Marek Bouška
Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (10), pp.105006. ⟨10.1088/1361-6595/abb0d0⟩
Plasma Sources Science and Technology, 2020, 29 (10), pp.105006. ⟨10.1088/1361-6595/abb0d0⟩
Excited species, reactive neutral species and positive ions, produced during the etching of Ge, Se and GeSe2 targets in inductively coupled plasmas, were identified by means of mass spectrometry (MS) and optical emission spectroscopy. The surface of
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8143b95f03066dc19e9159fca66e16b6
https://doi.org/10.1088/1361-6595/abb0d0
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9
Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties
Autor: Aurélie Girard, Christophe Cardinaud, Mohamed Boufnichel, F. Roqueta, Ahmed Rhallabi, Guillaume Le Dain, Marie-Claude Fernandez
Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2018, 36 (3), ⟨10.1116/1.5023590⟩
The authors developed a tool using a multiscale approach to simulate the silicon etching using Bosch process. Their study is focused on the analysis of the effect of the oxygen addition to C4F8 plasma during the deposition pulse. This is the compleme
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2fe1ff2b57296a78bbe131c2a500a6eb
https://hal.archives-ouvertes.fr/hal-01848351
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10
A General Approach Based on Sampled-Current Voltammetry for Minimizing Electrode Fouling in Electroanalytical Detection
Autor: Olivier de Sagazan, Aurélie Girard, Isabelle Mazerie, Florence Razan, Philippe Hapiot, Pierre Didier, Nathalie Coulon, Didier Floner, Florence Geneste
Publikováno v: ChemElectroChem
ChemElectroChem, 2018, 5 (1), pp.144-152. ⟨10.1002/celc.201700884⟩
ChemElectroChem, Weinheim : Wiley-VCH, 2018, 5 (1), pp.144-152. ⟨10.1002/celc.201700884⟩
International audience; Electrochemical analysis of species known to passivate electrode surfaces remains challenging. We previously proposed a new method dealing with sampled-current voltammetry performed on an electrode array to mimic polarography
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e0e593b0e4f8bb01574786d22ff39643
https://hal.science/hal-01735559/document
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