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pro vyhledávání: '"Atusko Yamaguchi"'
Autor:
Taku Hirayama, Junichi Onodera, Takaaki Kumise, Hideo Hada, Yuusuke Tanaka, Daiju Shiono, Atusko Yamaguchi, Iwao Nishiyama, Hiroaki Oizumi
Publikováno v:
Journal of Photopolymer Science and Technology. 20:403-410
We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for which the position and number of protected hydroxyl groups have no dispersion, and evaluated the EUV patterning performance of a chemically amplified positive-tone resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d48b543424d2e008d917bcf974c406ea
https://doi.org/10.2494/photopolymer.20.403
https://doi.org/10.2494/photopolymer.20.403
