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pro vyhledávání: '"Atteye Houssein Abdourazak"'
Autor:
Thomas John Markley, John Anthony Marsella, Richard Van Court Carr, Eric Anthony Robertson, Atteye Houssein Abdourazak
Publikováno v:
SPIE Proceedings.
Norbornene monomers with fluorinated substituents are often used in copolymers targeted for photoresist applications at 157 nm. Homopolymers of these norbornene monomers typically exhibit an absorption coefficient greater than 1.5 μm -1 . Comonomers
Autor:
Christopher K. Ober, Vladimir Jakubek, Eric Anthony Robertson, John Anthony Marsella, Thomas John Markley, Atteye Houssein Abdourazak
Publikováno v:
SPIE Proceedings.
Electromagnetic radiation in the vacuum-ultraviolet (VUV) region is needed for imaging of very fine features at the 65 nm and 45 nm nodes. Photolithography using 157-nm radiation, emitted from an F 2 excimer laser, is a candidate for next generation