Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Atsushi Uemoto"'
Publikováno v:
Journal of Alloys and Compounds. 577:S717-S721
In order to improve microstructure analysis with electron microscopes, we have developed an instrument that is based on a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB). The most characteristic point is that the SEM
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::88297921d264140323c13abd90408f92
https://doi.org/10.1016/j.jallcom.2012.02.019
https://doi.org/10.1016/j.jallcom.2012.02.019
Autor:
Hiroyuki Suzuki, Atsushi Uemoto, Hidekazu Susuki, Xin Man, Toshiaki Fujii, Masakatsu Hasuda, Tatsuya Asahata
Publikováno v:
Microscopy and Microanalysis. 20:354-355
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::08faa7787f5eb88755b855e288043ab4
https://doi.org/10.1017/s1431927614003493
https://doi.org/10.1017/s1431927614003493
Autor:
Mario Dellagiovanna, Osamu Takaoka, Stephane Benard, Ryoji Hagiwara, Hidenori Yoshioka, Atsushi Uemoto, Takuya Nakaue, Hiroyuki Miyashita, Syuichi Kikuchi, Shiaki M. Murai
Publikováno v:
SPIE Proceedings.
For almost a decade Nanomachining application has been studied and developed to repair next generation of photomasks. This technique, based on Atomic Force Microscopy (AFM), applies a mechanical removing of the defects with almost negligible quartz-d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3e682b87dba378354b69d7863361471
https://doi.org/10.1117/12.746405
https://doi.org/10.1117/12.746405
Autor:
Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7762506dbb59af2dc57aa703066d5486
https://doi.org/10.1117/12.632756
https://doi.org/10.1117/12.632756
Autor:
Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b41098a2f66ac75dfe7a30b74006cb6f
https://doi.org/10.1117/12.557789
https://doi.org/10.1117/12.557789
Publikováno v:
SPIE Proceedings.
Semiconductor device manufacturing demands rapid ramp of yield together with feature size reduction, especially for logic and ASIC because of their short-lives and small volume production characteristics. As a technological breakthrough for rapid yie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30a6ce49910893609379894e613d69f8
https://doi.org/10.1117/12.483688
https://doi.org/10.1117/12.483688
Publikováno v:
Journal of The Surface Finishing Society of Japan. 63:215
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10952e79461c0c1470a1028d0860f1c1
https://doi.org/10.4139/sfj.63.215
https://doi.org/10.4139/sfj.63.215
Publikováno v:
Applied Optics. 32:653
An application of optical parallel processing in the generation of fractal images is presented.Iterated function systems [ M. Barnsley , Fractals Everywhere ( Academic, Boston, Mass., 1988), Chap. 3] are the basis of the operation, which can be easil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::11a9c5d5b282a14fc79aa53b86ba92ea
https://doi.org/10.1364/ao.32.000653
https://doi.org/10.1364/ao.32.000653