Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Atsushi Tatsugawa"'
Autor:
Kenji Saitou, Tadashi Oomatsu, Noriko Yamashita, Toshihide Ishioka, Kazuyuki Usuki, Takashi Katou, Atsushi Tatsugawa
Publikováno v:
SPIE Proceedings.
Duplicated templates from a patterned silicon master were studied. The pattern was fabricated on a silicon wafer by rotary electron beam (EB) writer and reactive ion etching (RIE). 2.5-inch full surface discrete track media (DTM) templates of TP70nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6f065e916fe6c7d2d9dfecff41f1d78
https://doi.org/10.1117/12.864192
https://doi.org/10.1117/12.864192
