Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Atsushi Someya"'
Autor:
Tomoyuki Matsuyama, Hisashi Nishinaga, Ken Ozawa, Toshiharu Nakashima, Masato Hamatani, Isao Mita, Boontarika Thunnakart, Yasushi Mizuno, Atsushi Someya, Tokihisa Kaneguchi
Publikováno v:
SPIE Proceedings.
For an ultra-high numerical aperture (NA), such as that exceeding 0.9, the p-polarized component of light that has passed through a region at the limit of the NA of a high-NA lithography tool, degrades contrast because of the so-called vector imaging
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::20224f85d16282bb25e39970b2e74a2c
https://doi.org/10.1117/12.656242
https://doi.org/10.1117/12.656242
Publikováno v:
Optical Microlithography XVIII.
As the pattern feature-size of devices shrinks down to below 65 nm, it becomes more important to establish methods to control lithographic critical dimension (CD) that enable better controllability of CD after etching. This paper introduces new metho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64ec2a11bf101017225854fc7fd51fa5
https://doi.org/10.1117/12.598574
https://doi.org/10.1117/12.598574
Autor:
Atsushi SOMEYA
Publikováno v:
Journal of the Robotics Society of Japan. 9:922-924
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be68b4b16dade9d7245358b9d572193d
https://doi.org/10.7210/jrsj.9.922
https://doi.org/10.7210/jrsj.9.922