Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Astrid Sippel"'
Autor:
Astrid Sippel, Cleonisse Serrecchia, Tristan Combier, Dario Alliata, Stephane Godny, Philippe Gastaldo
Publikováno v:
International Symposium on Microelectronics. 2017:000087-000092
In this paper, Confocal Chromatic Microscopy was investigated to characterize the micro-bump fabrication process. We designed and fabricated in house a new detector that integrates through the same optical chromatic lens two light beams that are refl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8b1de22d488c913a8bc5166e75802a4
https://doi.org/10.4071/isom-2017-tp35_025
https://doi.org/10.4071/isom-2017-tp35_025
Autor:
Charles Crawford, Stuart Gough, Frank Sundermann, Carlo Pogliani, Félix Dufaye, Hiroyuki Miyashita, Astrid Sippel, Christophe Brochard, Edgardo García-Berríos, Mark Wylie, Luca Sartelli, Carl Hess
Publikováno v:
SPIE Proceedings.
193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long periods. However, these 193nm binary photomasks can be impacted by a phenome
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::078d2e2d948fe0a0b123bc0840ef1f8b
https://doi.org/10.1117/12.2029470
https://doi.org/10.1117/12.2029470
Autor:
Luca Sartelli, Félix Dufaye, Stuart Gough, Hiroyuki Miyashita, Astrid Sippel, Frank Sundermann, Ernesto Villa
Publikováno v:
25th European Mask and Lithography Conference.
The paper describes a new approach of evaluating isolated opaque defects, as well as CD-like defects on hole layer, using features available on the inspection tool. This eliminates further verifications on specific tools, which would result in their
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05f7e93f6749d31bf1477b543ae1d6c7
https://doi.org/10.1117/12.835191
https://doi.org/10.1117/12.835191