Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Astrid Gettel"'
Autor:
Julien Bounouar, Arnaud Favre, Astrid Gettel, Ingo Stassen, Olivier Le-Barillec, Emmanuelle Veran, Thi Quynh Nguyen
Publikováno v:
Solid State Phenomena. 219:251-255
Airborne Molecular Contamination (AMC) concentrations become critical during queue-time (between two successive process steps) when wafers are degassing inside Front Opening Unified Pod (FOUP), a confined environment [1]. In that case, AMC concentrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f573e497ef5ffcd29e451437334b922f
https://doi.org/10.4028/www.scientific.net/ssp.219.251
https://doi.org/10.4028/www.scientific.net/ssp.219.251
Selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium
