Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Asmaa Rabie"'
Autor:
Ahmed Khater, Aliaa Kabeel, Mohamed Ismail, Wael El-Manhawy, Sarah Rizk, Asmaa Rabie, Joe Kwan
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
As the litho hotspot detection runtime is currently in a continuous increase with sub-10nm technology nodes due to the increase of the design and process complexity, new methods and approaches are needed to improve the runtime while guaranteeing high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::953170bcd30c9ada3a518ce85d8f99c6
https://doi.org/10.1117/12.2551827
https://doi.org/10.1117/12.2551827
Autor:
Ira Leventhal, Ghada Sokar, Yassien Zakaria, Xinli Gu, Jochen Rivoir, Kareem Madkour, Asmaa Rabie, Haralampos-G. Stratigopoulos
Publikováno v:
VTS
2019 IEEE 37th VLSI Test Symposium, VTS 2019
2019 IEEE 37th VLSI Test Symposium, VTS 2019
Over the last decade there has been a surge of activity in employing advanced statistical analysis and machine learning methods to various test-related tasks. The topic is no longer simply a matter of academic curiosity but, rather, a pressing need o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3097ea7c2785e40fd91e56756a8e8fdb
https://research.tue.nl/en/publications/d80e8461-e420-4852-a77c-00b22b78c079
https://research.tue.nl/en/publications/d80e8461-e420-4852-a77c-00b22b78c079
Autor:
Jae-Hyun Kang, Aliaa Kabeel, Namjae Kim, Sangah Lee, Wael ElManhawy, Marwah Shafee, Sangwoo Jung, Asmaa Rabie, Kareem Madkour, Ahmed ElGhoroury, Seung Weon Paek, Joe Kwan, Ki-Heung Park, Jiwon Oh
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
As the typical litho hotspot detection runtime continue to increase with sub-10nm technology node due to increasing design and process complexity, many DFM techniques are exploring new methods that can expedite some of their advanced verification pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e13a5caba02a84fbb7cb58fe50d3c67
https://doi.org/10.1117/12.2515139
https://doi.org/10.1117/12.2515139
Autor:
Asmaa Rabie
Publikováno v:
XRDS: Crossroads, The ACM Magazine for Students. 23:55-55
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8301d459d3dcd44d7bc1d7f27a20414
https://doi.org/10.1145/3063812
https://doi.org/10.1145/3063812
Publikováno v:
SPIE Proceedings.
Sub-20nm node designs are getting more sophisticated, and printability issues become more critical which need more advanced techniques to fix. It is mandatory for designers to run lithography checks before tapeout, and it is very challenging to fix a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fec46726b3f1e9841ffbacfb9d95ba33
https://doi.org/10.1117/12.2045744
https://doi.org/10.1117/12.2045744
Autor:
Asmaa Rabie
Publikováno v:
XRDS: Crossroads, The ACM Magazine for Students. 23:65-65
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::547927e712d86248bd5dc9c95451f765
https://doi.org/10.1145/3021559
https://doi.org/10.1145/3021559
Autor:
Asmaa Rabie
Publikováno v:
XRDS: Crossroads, The ACM Magazine for Students. 23:65-65
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::044428676301a2fc02b2f44f5f6efd76
https://doi.org/10.1145/2983455
https://doi.org/10.1145/2983455
Autor:
Asmaa Rabie
Publikováno v:
XRDS: Crossroads, The ACM Magazine for Students. 22:55-55
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcdb0033493f359ab5d58e14677c40ec
https://doi.org/10.1145/2951022
https://doi.org/10.1145/2951022
Autor:
Asmaa Rabie
Publikováno v:
XRDS: Crossroads, The ACM Magazine for Students. 22:79-79
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b34c9c0db28eea3958c545a5172cd59
https://doi.org/10.1145/2893521
https://doi.org/10.1145/2893521