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Autor:
Sidlgata V. Sreenivasan, Jin Choi, Kevin J. Nordquist, Lester Casoose, K. Gehoski, William J. Dauksher, Douglas J. Resnick, Ashuman Cherala
Publikováno v:
Microelectronic Engineering. :633-640
High-resolution overlay is considered to be an important challenge for imprint lithography processes. A key advantage of Step and Flash(TM) Imprint Lithography (S-FIL(TM)) is that it uses low-pressures (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c472c15a63e18452e3e7e3164960190
https://doi.org/10.1016/j.mee.2004.12.097
https://doi.org/10.1016/j.mee.2004.12.097
