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pro vyhledávání: '"Ashok Kherodia"'
Autor:
Ashok Kherodia, Ashish K. Panchal
Publikováno v:
Materials for Renewable and Sustainable Energy, Vol 6, Iss 4, Pp 1-6 (2017)
Abstract Multilayer thin films with alternate hydrogenated amorphous (a-Si:H) and nanocrystalline silicon (nc-Si:H) layers are deposited in hot wire chemical vapor deposition (HWCVD) chamber using hydrogen (H2) dilution of silane (SiH4). Two sets (tw
Externí odkaz:
https://doaj.org/article/8fcf8541117449c29f3f0ffac416198c
Autor:
Ashish K. Panchal, Ashok Kherodia
Publikováno v:
Thin Solid Films. 654:16-22
A layered structure of nanocrystalline Silicon (nc-Si) and Si compound dielectric (SiO2, Si3N4, SiC) is becoming popular for the third generation photovoltaics because of its tunable optical bandgap. However, this structure makes poor current conduct
Publikováno v:
Silicon. 10:1475-1485
The multilayered thin film structure of amorphous silicon (a-Si:H) and nanocrystalline silicon (nc-Si:H) provides the possibility of bandgap tuning for fabrication of multijunction solar cells. This paper communicates a detailed analysis of optical a
Autor:
Ashish K. Panchal, Ashok Kherodia
Publikováno v:
Energy Procedia. :2193-2198
Silicon multilayer thin films with stack of amorphous silicon (a-Si:H) and nanocrystalline silicon (nc-Si:H) of varied hydrogen dilution were prepared by hot wire chemical vapor deposition (HWCVD). The optical properties of the thin films were measur