Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Arun Kumar Gnanappa"'
Autor:
Arun Kumar Gnanappa, Evangelos Gogolides, Athanasios G. Papathanasiou, Andreas G. Boudouvis, Dimitrios P. Papageorgiou, Angeliki Tserepi
Publikováno v:
Plasma Processes and Polymers. 9:304-315
Plasma etched and simultaneously randomly roughened (nanotextured) polymethylmethacrylate (PMMA) substrates show hierarchical roughness and complex high-aspect-ratio morphology. Here, they are investigated as superamphiphobic surfaces, after plasma d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a31b82b4eee3ce262c213bf7b8f3cd43
https://doi.org/10.1002/ppap.201100124
https://doi.org/10.1002/ppap.201100124
Autor:
Orla Slattery, Tony O’Hara, Syed A. M. Tofail, Cian O'Murchu, Frank H. Peters, Arun Kumar Gnanappa, Balazs Aszalos-Kiss
Publikováno v:
Applied Surface Science. 257:4331-4338
A hydrophobic self-assembled monolayer (SAM) of fluoro-octyl-trichloro-silane (FOTS) was deposited on silicon using a vapor phase technique. The aging of the hydrophobic layer was examined using water contact angle measurements. It has been found tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff87c97deb1224d45b939d9cab704781
https://doi.org/10.1016/j.apsusc.2010.12.052
https://doi.org/10.1016/j.apsusc.2010.12.052
Publikováno v:
Microfluidics and Nanofluidics. 10:1351-1357
The dynamic contact line behavior of water on nanotextured rough hydrophobic and superhydrophobic surfaces is studied and contrasted to smooth hydrophobic surfaces for application in immersion lithography. Liquid loss occurs at the receding meniscus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5f9d9243b5832dbb81de783846a4dcd
https://doi.org/10.1007/s10404-010-0762-5
https://doi.org/10.1007/s10404-010-0762-5
Autor:
Orla Slattery, Arun Kumar Gnanappa, Balazs Aszalos-Kiss, Cian O'Murchu, Frank H. Peters, Syed A. M. Tofail
Publikováno v:
Polymer Degradation and Stability. 93:2119-2126
Fluorinated amorphous carbon (a-C:F) films e.g. plasma polymerised perfluorocyclobutane have long attracted much consideration due to their low surface energy, hydrophobicity, low refractive index, good electrical and thermal insulation and good ther
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcbc4a45de6e89eb37d77147b02b2302
https://doi.org/10.1016/j.polymdegradstab.2008.08.012
https://doi.org/10.1016/j.polymdegradstab.2008.08.012
Autor:
Tony O’Hara, Frank H. Peters, Cian O'Murchu, Arun Kumar Gnanappa, Balazs Aszalos-Kiss, Syed A. M. Tofail, Orla Slattery
Publikováno v:
The Journal of Physical Chemistry C. 112:14934-14942
The hydrolytic stability and the effect of annealing on the improved aging properties of self-assembled monolayer (SAM) hydrophobic coatings have been investigated. Surfaces coated with hydrophobic SAM coatings give higher flow rate and are of wide i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a8019351b79cf1675e104b178c88e02
https://doi.org/10.1021/jp804745t
https://doi.org/10.1021/jp804745t
Autor:
Fabrizio Evangelista, Emilien Feuillet, Arun Kumar Gnanappa, Nina Vladimirovna Dziomkina, Michel Riepen, Evangelos Gogolides
Publikováno v:
SPIE Proceedings.
Failure of the receding meniscus during immersion lithography is one of the well known problems. A thin liquid film left behind on the wafer during scanning may generate imaging defects. Liquid loss occurs at the receding meniscus when the smooth sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d377c1f4cc3d4f9fdc0360a549844b0c
https://doi.org/10.1117/12.881605
https://doi.org/10.1117/12.881605
Autor:
Costas A. Charitidis, Amalia Skarmoutsou, Angeliki Tserepi, Evangelos Gogolides, Arun Kumar Gnanappa
Publikováno v:
Nanotechnology. 23:505711
Oxygen plasma-induced surface modification of polymethylmethacrylate (PMMA), under plasma conditions favouring (maximizing) roughness formation, has been shown to create textured surfaces of roughness size and morphology dependent on the plasma-treat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4bbe1d9153cef899aecb6706cbc561e6
https://doi.org/10.1088/0957-4484/23/50/505711
https://doi.org/10.1088/0957-4484/23/50/505711