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pro vyhledávání: '"Arthur Buechel"'
Autor:
Arthur Buechel, Benjamin Strahm, Joachim Mai, Derk Baetzner, Damien Lachenal, Yoann Andrault, Bruno Mendes, Manuela Kobas, C. Guerin, Thomas Schulze, Guillaume Wahli
Publikováno v:
MRS Proceedings. 1245
This work reports the first results of a new generation plasma-enhanced chemical vapor deposition (PECVD) reactor manufactured by Roth and Rau. This large area parallel plate reactor has been especially designed for the manufacturing of silicon heter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e1e597d3ad9f8d62090375b7bcf0a25
https://doi.org/10.1557/proc-1245-a01-04
https://doi.org/10.1557/proc-1245-a01-04
