Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Artem Shamsuarov"'
Publikováno v:
Image Processing: Algorithms and Systems
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b11a37b0cb6dc9a22c9e9c6e212e3291
https://doi.org/10.2352/issn.2470-1173.2016.15.ipas-186
https://doi.org/10.2352/issn.2470-1173.2016.15.ipas-186
Autor:
Artem Shamsuarov, Yury Vyacheslavovich Slynko, Oleg Muratov, Vitaly Vladimirovich Chernov, Maria Mikhailovna Lyubimtseva, Victor Bucha
Publikováno v:
CVPR Workshops
We propose a method of reconstruction of 3D representation (a mesh with a texture) of an object on a smartphone with a monocular camera. The reconstruction consists of two parts – real-time scanning around the object and postprocessing. At the scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f4d023a057935c490e101536c07d1c26
https://doi.org/10.1109/cvprw.2016.116
https://doi.org/10.1109/cvprw.2016.116
Publikováno v:
CDC
In this paper, we propose a new observer design approach for a class of hybrid systems with jumps of the state. The idea is to “glue” the jump set (a part of domain where the jumps take place) onto its image. Then, on the “glued” domain, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f5a5ec771db275303430e9eba44b41f
https://doi.org/10.1109/cdc.2014.7039372
https://doi.org/10.1109/cdc.2014.7039372
Autor:
Seung-Hune Yang, Dmitry Vengertsev, Jung-Dal Choi, Ki-Hyun Kim, Sooryong Lee, Seongbo Shim, Artem Shamsuarov, Seong-Woon Choi, Ho-Kyu Kang, Seongho Moon
Publikováno v:
SPIE Proceedings.
Model-based Optical Proximity Correction (OPC) is widely used in advanced lithography processes. The OPC model contains an empirical part, which is calibrated by fitting the model with data from test patterns. Therefore, the success of the OPC model
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0bce54354637fc28ac3ec290f30d552d
https://doi.org/10.1117/12.953827
https://doi.org/10.1117/12.953827
Autor:
Vitaliy Domnenko, Seung-Hune Yang, Thomas Mülders, Sung-Woon Park, Ulrich Klostermann, Seongho Moon, Bernd Küchler, Artem Shamsuarov
Publikováno v:
SPIE Proceedings.
DRAM chip space is mainly determined by the size of the memory cell array patterns which consist of periodic memory cell features. Resolution Enhancement Techniques are used to optimize the periodic pattern process performance. This is often realized
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::928195d8513572257fa05df143fcbf20
https://doi.org/10.1117/12.916528
https://doi.org/10.1117/12.916528
Autor:
Thomas Schmöller, Young-Chang Kim, Bernd Küchler, John Lewellen, Seung-Hune Yang, Eun-Ju Kim, Chang-Jin Kang, Seongho Moon, Ulrich Klostermann, Junghoon Ser, Sooryong Lee, Seong-Woon Choi, Artem Shamsuarov
Publikováno v:
SPIE Proceedings.
In this paper, we discuss the accuracy of resist model calibration under various aspects. The study is done based on an extensive OPC dataset including hundreds of CD values obtained with immersion lithography for the sub-30 nm node. We address imagi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81a6de21215b4f60a91dd30d41b71359
https://doi.org/10.1117/12.879592
https://doi.org/10.1117/12.879592