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pro vyhledávání: '"Arnold J. v. Run"'
Publikováno v:
Japanese Journal of Applied Physics. 32:5982
A new 3-lens electron optical column using a Schottky emitter has been designed to perform very high-resolution lithography and also to produce reticles with good throughput. The theoretical performance has been computed from the source and lens char
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::387cf3c24a2f1188e17b984d14d331d8
https://doi.org/10.1143/jjap.32.5982
https://doi.org/10.1143/jjap.32.5982
