Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Arnaud Yvon"'
Autor:
Taoufik Slimani Tlemcani, Clément Mauduit, Micka Bah, Meiling Zhang, Matthew Charles, Romain Gwoziecki, Arnaud Yvon, Daniel Alquier
Publikováno v:
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces, 2023, 15 (6), pp.8723-8729. ⟨10.1021/acsami.2c21106⟩
ACS Applied Materials & Interfaces, 2023, 15 (6), pp.8723-8729. ⟨10.1021/acsami.2c21106⟩
International audience; The fabrication of low-resistance and thermally stable Ohmic contacts is essential for the realization of reliable GaN power devices. In the particular case of p-type GaN, a thin Ni/Au bilayer is commonly used for Ohmic contac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7609523f38c99793e53bf061a4d442d0
https://hal.science/hal-04052512
https://hal.science/hal-04052512
Autor:
Imen Abdennabi, Nathalie Batut, Ambroise Schellmanns, Lionel Jaouen, Fabrice Roqueta, Arnaud Yvon, Sophie Ngo
Publikováno v:
2022 IEEE International Conference on Electrical Sciences and Technologies in Maghreb (CISTEM).
Autor:
Martin Doublet, Nicolas Defrance, Etienne Okada, Loris Pace, Thierry Duquesne, Bouyssou Emilien, Arnaud Yvon, Nadir Idir, Jean-Claude De Jaeger
Publikováno v:
Electronics; Volume 12; Issue 9; Pages: 2007
Electronics
Electronics, 2023, 12 (9), pp.2007. ⟨10.3390/electronics12092007⟩
Electronics
Electronics, 2023, 12 (9), pp.2007. ⟨10.3390/electronics12092007⟩
International audience; In this paper, a methodology is proposed for studying the current collapse effects of Gallium Nitride (GaN) power diodes and the consequences on the dynamic on-resistance (RON). Indeed, the growing interest of GaN based, high
Publikováno v:
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
In lateral power diodes, the conductivity modulation mechanism can pave the way to the demonstration of surge current capability. In a Hybrid Anode Diode concept with a p-GaN layer, an anode contact on p-GaN layer can be a source of hole injection th
Autor:
Wahid Khalfaoui, Frédéric Cayrel, Emmanuel Collard, Maher Nafouti, Daniel Alquier, Georgio El-zammar, Arnaud Yvon
Publikováno v:
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing, Elsevier, 2018, 78, pp.107-110. ⟨10.1016/j.mssp.2017.11.021⟩
Materials Science in Semiconductor Processing, Elsevier, 2018, 78, pp.107-110. ⟨10.1016/j.mssp.2017.11.021⟩
In this work, non-recessed and Au-free low resistance Ohmic contacts are investigated on AlGaN/GaN on silicon. Based on Ti/Al bilayers, Circular TLM are fabricated and contact values are extracted varying different parameters such as single and combi
Autor:
Arnaud Yvon, Nicolas Thierry-Jebali, Amira Souguir-Aouani, Emmanuel Collard, Dominique Planson, Dominique Tournier
Publikováno v:
Materials Science Forum
Materials Science Forum, Trans Tech Publications Inc., 2016, 858, pp.1190-1193. ⟨10.4028/www.scientific.net/MSF.858.1190⟩
Materials Science Forum, Trans Tech Publications Inc., 2016, 858, pp.1190-1193. ⟨10.4028/www.scientific.net/MSF.858.1190⟩
This work presents the impact analysis of physical and geometrical parameters on the on-resistance and the breakdown voltage in order to optimize a 600 V pseudo-vertical GaN/Si Schottky rectifier. The results by finite element simulations indicate th
Two-dimensional dopant profiling of gallium nitride p–n junctions by scanning capacitance microscopy
Autor:
Emmanuel Collard, M. Lamhamdi, Arnaud Yvon, Daniel Alquier, Eric Frayssinet, Yvon Cordier, Anne Elisabeth Bazin, Frédéric Cayrel
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 372:67-71
Two-dimensional imaging of dopant profiles for n and p-type regions are relevant for the development of new power semiconductors, especially for gallium nitride (GaN) for which classical profiling techniques are not adapted. This is a challenging tas
Publikováno v:
physica status solidi (a). 213:2364-2370
Efficient edge terminations are fundamental for power electronic devices. High resistive edge termination technique obtained by ion implantation is a possible solution for GaN Schottky barrier diodes (SBD), but may induce defects detrimental to the d
Autor:
Emmanuel Collard, Mohamed Lamhamdi, Arnaud Yvon, Jean Christophe Houdbert, Frédéric Cayrel, Daniel Alquier, Anne Elisabeth Bazin
Publikováno v:
Materials Science Forum. 711:213-217
In this paper, we evaluated gallium nitride heteroepitaxially grown on sapphire (GaN/Sa) and grown on silicon (GaN/Si) faced to implantation doping. Si+ was implanted on low doped n-type epilayers in order to create a plateau around 1020at.cm-3. All
Autor:
Emmanuel Collard, Olivier Ménard, Olivier Dezellus, J.C. Viala, Arnaud Yvon, Christian Brylinski, Nicolas Thierry-Jebali, Miao Zhe
Publikováno v:
Materials Science Forum
Materials Science Forum, Trans Tech Publications Inc., 2011, 679-680, pp.812-815. ⟨10.4028/www.scientific.net/MSF.679-680.812⟩
Materials Science Forum, Trans Tech Publications Inc., 2011, 679-680, pp.812-815. ⟨10.4028/www.scientific.net/MSF.679-680.812⟩
International audience; Ohmic contacts represent a major technological brick for the development of high power devices on Gallium Nitride. Al(200 nm) Ti(70 nm) metallization on n+-GaN, annealed at 650 °C, provides a “Specific Contact Resistivity