Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Arnaud Mader"'
Publikováno v:
IEEE Photonics Technology Letters. 31:857-860
An accurate (≤5°) and straightforward implementation optical method for determining the azimuthal lattice orientation of a microstructured optical fiber with respect to the side illumination beam used for Bragg grating recording is presented. This
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a0f2909c95eaef5246d59203737812e4
https://doi.org/10.1109/lpt.2019.2910461
https://doi.org/10.1109/lpt.2019.2910461
Autor:
Gabriel D. Bernasconi, Eric Tremblay, Juergen Brugger, Christophe Moser, Arnaud Mader, Jonas Grossenbacher, Victor J. Cadarso, Seyed Payam Vahdati, Mickael Guillaumee, Randall Sprague
Publikováno v:
Journal of Display Technology. 10:444-449
A volume hologram recorded with a lens array is proposed as a color transflective screen for Head Worn Display (HWD) systems. Design, fabrication as well as proof of concept are reported. Light from a single MEMS-based projector is efficiently diffra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::725f29594f1e851d0350b1e885a319b6
https://doi.org/10.1109/jdt.2013.2277933
https://doi.org/10.1109/jdt.2013.2277933
Autor:
Juergen Brugger, Christophe Moser, Mickael Guillaumee, Seyed Payam Vahdati, Victor J. Cadarso, Arnaud Mader, Randall Sprague, Jonas Grossenbacher, Eric Tremblay
Publikováno v:
SPIE Proceedings.
A volume hologram recorded with a lens array is proposed as a transflective screen for Head Worn Display (HWD) systems. Design, fabrication as well as proof of concept are reported. Light from a projection system, with similar properties to one mount
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6e191e656b7f86d796f669e4225260a
https://doi.org/10.1117/12.2000642
https://doi.org/10.1117/12.2000642
Autor:
M. Prea, Giovanni Bianucci, Max C. Schürmann, Fabio Zocchi, G. Salmaso, Giuseppe Valsecchi, Arnaud Mader, Gian Luca Cassol, J. Kools, Denis Bolshukhin, Peter Zink, Guido Schriever
Publikováno v:
Alternative Lithographic Technologies.
The power roadmap for EUVL high volume manufacturing (HVM) exceeds the 200W EUV in-band power at intermediate focus, thus posing more demanding requirements on HVM sources, debris suppression systems and collectors. Starting from the lessons learned
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0007f316e0cd330eef8f9968c067ad0
https://doi.org/10.1117/12.813652
https://doi.org/10.1117/12.813652
Autor:
Max C. Schürmann, Peter Zink, Günther Derra, Erik Wagenaars, Marc Corthout, Hans Scheuermann, Guido Schriever, Jeroen Jonkers, Rolf Apetz, Guido Seimons, Marcel Damen, Peiter van de Wel, Rob Snijkers, Jesko Dr. Brudermann, Jürgen Klein, Masaki Yoshioka, Willi Neff, Oliver Franken, Oliver Zitzen, Dominik Marcel Vaudrevange, Felix Küpper, Arnaud Mader
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d8e8a04b4a2de39e064683cab332b4a
https://doi.org/10.1117/12.772633
https://doi.org/10.1117/12.772633
Autor:
Arnaud Mader, Adam Brunton, Klaus Bergmann, Giorgio Pirovano, Giovanni Bianucci, Hans Scheuermann, Peter Zink, Gian Luca Cassol, Fabio Zocchi, Oliver Franken
Publikováno v:
SPIE Proceedings.
The paper presents the results of an investigation into the thermal and optical characteristics of alpha-type dual-mirror grazing incidence collectors for Extreme Ultra-violet Lithography integrated into a tin-fueled discharge produced plasma source.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da88e809a3ee66a75d6db7ec894ee910
https://doi.org/10.1117/12.772977
https://doi.org/10.1117/12.772977
Autor:
Willi Neff, Oliver Franken, Andreas List, Marcel Damen, Oliver Zitzen, Maurice Janssen, Klaus Bergmann, Joseph Pankert, Helmar Kraus, Peter Zink, Dominik Marcel Vaudrevange, Dirk Wagemann, Thomas Krücken, Stefan Schwabe, Micheal Loeken, Stefan Seiwert, Rolf Apetz, Oliver Rosier, Günther Derra, Christof Metzmacher, Ralph Prummer, Achim Weber, Jeroen Jonkers, Arnaud Mader, Sven Probst, Guido Siemons, Jürgen Klein
Publikováno v:
SPIE Proceedings.
In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regener
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02052cc3f501f7ec7b98a546edfd7b4f
https://doi.org/10.1117/12.657066
https://doi.org/10.1117/12.657066