Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Arnaud Castex"'
Publikováno v:
ECS Solid State Letters. 2:P47-P50
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bba401a112475a97f22e91ffcb230319
https://doi.org/10.1149/2.006306ssl
https://doi.org/10.1149/2.006306ssl
Autor:
Richard Fontaniere, Arnaud Castex, Marcel Broekaart, Chrystelle Lagahe-Blanchard, Karine Landry
Publikováno v:
ECS Transactions. 50:371-377
Significant distortion can originate during the bonding process, resulting in overlay issues for final backside illumination image sensor wafer processing, impacting final wafer yield and device reliability. This paper presents a distortion free bond
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb70e991b643759347a56907134b453c
https://doi.org/10.1149/05007.0371ecst
https://doi.org/10.1149/05007.0371ecst
Autor:
Chrystelle Lagahe, Arnaud Castex, Richard Fontaniere, Stephane Thieffry, Karine Landry, Marcel Broekaart
Publikováno v:
ECS Transactions. 35:145-151
This paper presents a new wafer bonding process used for back side illuminated (BSI) image sensors manufacturing, with high bonding energy of 2 J/m2, without peripheral edge bonding voids that occur with the standard process.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ae987dd7e803e57eb38a5af633c86e7
https://doi.org/10.1149/1.3568856
https://doi.org/10.1149/1.3568856
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:1343-1354
As interconnects are scaled down, much effort is made to achieve ultralow k material with a dielectric constant lower than 2.5. Thus, many new precursors are investigated in plasma-enhanced chemical vapor deposition. This is particularly true with th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6cf8e0a1495081fdd8234c87445a3c5d
https://doi.org/10.1116/1.2953704
https://doi.org/10.1116/1.2953704
Autor:
Arnaud Castex, Marcel Broekaart, Stephane Thieffry, Karine Landry, Richard Fontanière, Chrystelle Lagahe
Publikováno v:
ECS Meeting Abstracts. :1157-1157
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ddfcc3239a41e25b9ca6c6936a6448f
https://doi.org/10.1149/ma2011-01/16/1157
https://doi.org/10.1149/ma2011-01/16/1157