Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Armin Brechling"'
Autor:
Loïc Joly, Norbert Müller, Thorsten Glaser, Karsten Kuepper, Anja Stammler, Andreas Helmstedt, Maik Heidemeier, Niklas Dohmeier, Erich Krickemeier, Ulrich Heinzmann, Armin Brechling, Aaron Gryzia, Hartmut Bögge
Publikováno v:
Magnetochemistry; Volume 2; Issue 1; Pages: 5
Subsequent to the similar [MnIII6CrIII]3+ single-molecule magnets (SMM), the recently studied [FeIII6CrIII]3+ structural type adsorbed thin films prepared on Si and gold-coated glass substrates have been experimentally studied by means of spin-polari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aadaaaab6e3013daf2b68fee76b15cc2
https://pub.uni-bielefeld.de/record/2900909
https://pub.uni-bielefeld.de/record/2900909
Autor:
Simone Jacob, Aaron Gryzia, Karl-Josef Dietz, Wiebke Hachmann, Ulrich Heinzmann, Armin Brechling, Andreas Winter, Ulf Kleineberg, J. Slieh, Andrea Kandlbinder
Publikováno v:
Thin Solid Films. 517:3257-3261
We report on the fabrication of single crystalline gold nanocrystals of sizes between 10 nm and 25 nm. Gold was deposited under ultra high vacuum conditions on a freshly-cleaved NaCl(100) surface by means of the Molecular Beam Epitaxy technique. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f455285bca278fb4076e3d0258176689
https://doi.org/10.1016/j.tsf.2008.11.130
https://doi.org/10.1016/j.tsf.2008.11.130
Autor:
Mikhail Fonin, Erich Krickemeyer, Thomas Tietze, Thorsten Glaser, Karsten Kuepper, Niklas Dohmeier, Loïc Joly, Andreas Helmstedt, Ulrich Heinzmann, Norbert Müller, Armin Brechling, Veronika Hoeke, Philipp Leicht, Aaron Gryzia
Single-molecule magnets (SMM) of the [MnIII6CrIII]3+ structural type prepared on Si and gold-coated glass substrates have been investigated by spin-resolved electron spectroscopy (SPES) and X-ray magnetic circular dichroism (XMCD) at the Mn L3,2 edge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::33c4e4565b5153eeec6cb4b769eedf24
Autor:
Hubert Brückl, M. Escher, M. Schicketanz, Gerd Schönhense, J. Slieh, T. Westerwalbesloh, N. Weber, M. Merkel, A. Wonisch, Ulrich Heinzmann, Ulrich Neuhäusler, J. Lin, Ulf Kleineberg, Armin Brechling, D. Valdaitsev, Andreas Oelsner, M. Brzeska
Publikováno v:
Microelectronic Engineering. 83:680-683
Extreme ultraviolet lithography (EUVL) at 13.5 nm is the next generation lithography technique capable of printing sub-50 nm structures. With decreasing feature sizes to be printed, the requirements for the lithography mask also become more stringent
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::343650694bd30aa5194b64d3c02ef859
https://doi.org/10.1016/j.mee.2005.12.035
https://doi.org/10.1016/j.mee.2005.12.035
Autor:
Naoufal Bahlawane, Edgar Fischer Rivera, Armin Brechling, Katharina Kohse-Höinghaus, Ulf Kleineberg
Publikováno v:
ResearcherID
The chemical vapor deposition method was used to deposit thin films of cobalt oxide starting with cobalt (II) acetylacetonate and oxygen. The deposition process was investigated and the obtained films were identified as a cubic spinel-type polycrysta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7399344493d8a0155952eaa2af5c81a1
https://doi.org/10.1016/j.apcatb.2004.06.001
https://doi.org/10.1016/j.apcatb.2004.06.001
Autor:
Ulrich Heinzmann, A Aschentrup, A. Gushterov, Armin Brechling, A. Szekeres, S Simeonov, Frank Hamelmann
Publikováno v:
Vacuum. 75:307-312
Silicon oxide thin films have been deposited in plasma-assisted CVD process. With tetraethylorthosilcate (TEOS, Si(OC2H5)(4)) as precursor and an oxygen RF-plasma, thin films of 50-100 nm were deposited on silicon wafers. The deposition process was c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d91843e852e7004ece3d8fd7d9d3e00f
https://doi.org/10.1016/j.vacuum.2004.03.012
https://doi.org/10.1016/j.vacuum.2004.03.012
Autor:
J Sandrock, Tatyana Ivanova, A Aschentrup, Kostadinka Gesheva, A. Szekeres, Ulrich Heinzmann, Peter Jutzi, Frank Hamelmann, Armin Brechling, Ulrich Siemeling
Publikováno v:
Thin Solid Films. 446:167-171
Molybdenum oxide thin films were prepared by plasma-enhanced chemical vapor deposition of molybdenum pentacarbonyl 1-methylbutylisonitrile. This precursor is an interesting alternative for the commonly used molybdenum hexacarbonyl, because the substa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b5b6ff35db55737cb1519f1d5b79661b
https://doi.org/10.1016/j.tsf.2003.09.045
https://doi.org/10.1016/j.tsf.2003.09.045
Single molecule magnets (SMM) deposited in submonolayers and monolayers have been analyzed with respect to their structures by means of non-contact AFM (topographic as well as damping mode) and Kelvin Probe Force Microscopy with molecular resolution.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb43281d066dfe3b0eb1b6d8abf6ed2a
https://pub.uni-bielefeld.de/record/2690976
https://pub.uni-bielefeld.de/record/2690976
Publikováno v:
Advanced Functional Materials. 11:208-212
We describe the suitability of ultra-high vacuum scanning tunneling microscopy (UHV-STM) based nanolithography by using highly ordered monomolecular organic films, called self-assembled monolayers (SAMs), as ultrathin resists. Organothiol-type SAMs s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec1038d3d14f910f8d961af781a7ff81
https://doi.org/10.1002/1616-3028(200106)11:3<208::aid-adfm208>3.0.co
https://doi.org/10.1002/1616-3028(200106)11:3<208::aid-adfm208>3.0.co
Autor:
Samuel Bouvron, Andreas Helmstedt, Norbert Müller, Armin Brechling, Mikhail Fonin, Alexander Harder, Thorsten Glaser, Veronika Hoeke, Marc Sacher, Aaron Gryzia, Ulrich Heinzmann, Erich Krickemeyer
X-ray absorption spectroscopy studies of the [(Mn6CrIII)-Cr-III](3+) single-molecule magnet deposited as a microcrystalline layer on gold substrates are presented. The oxidation state of the manganese centers changes from Mn-III to Mull due to irradi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a3c2e2814019a46d27f30d75aa230db1