Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Armelle Vix"'
Autor:
Corinna Koepernik, Lutz Bettin, Armelle Vix, Bernd Leibold, Joerg Butschke, Dirk Beyer, Mathias Irmscher, Rainer Plontke, Peter Voehringer
Publikováno v:
SPIE Proceedings.
The aim is to apply e-beam lithography for second level imaging of Alternating Phase Shift Masks (altPSM) in the 65 nm node and below. Difficulties due to charging effects arise when exposing areas where the chromium absorber has been cleared away. I
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc9020e29f120059656fef8fcc4a10d9
https://doi.org/10.1117/12.568033
https://doi.org/10.1117/12.568033
Autor:
Dirk Beyer, Lutz Bettin, Corinna Koepernik, Joerg Butschke, Rainer Plontke, Armelle Vix, Bernd Leibold, Peter Voehringer, Mathias Irmscher
Publikováno v:
SPIE Proceedings.
When e-beam lithography is applied for second level imaging of Alternating Phase Shift Masks charging effects on the cleared chrome absorber induces placement, overlay and pattern distortion of the second layer. The water soluble conductive to coat S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1150e07a2ca43406c63abc5011fd3f6
https://doi.org/10.1117/12.518037
https://doi.org/10.1117/12.518037
Publikováno v:
SPIE Proceedings.
In this contribution we will demonstrate how the use of negative tone CAR can significantly improve the CD control of mask layers in which CD is measured on opaque features. A thorough investigation of the individual contributions of sequential proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::209b6be3e7a0691093cc4ef5bca6d987
https://doi.org/10.1117/12.467429
https://doi.org/10.1117/12.467429