Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Arkadiusz Michal Karpinski"'
Autor:
Linda Cattin, Arkadiusz Michal Karpinski, P.-Y. Jouan, A. Ferrec, Luc Brohan, M. A. Djouadi, Mireille Richard-Plouet
Publikováno v:
Thin Solid Films. 520:3609-3613
Nickel oxide thin films were deposited by Direct Current magnetron reactive sputtering from Ni target onto SnO2:F conductive glass substrates. The process was carried out without intentional heating, in an argon/oxygen gas mixture with various oxygen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee5335a02568a97f4d1de66c3466c6f5
https://doi.org/10.1016/j.tsf.2011.12.068
https://doi.org/10.1016/j.tsf.2011.12.068
Autor:
Luc Brohan, Stéphane Guillerez, Hélène Terrisse, Solenn Berson, Maryline Mancini-Le Granvalet, Arkadiusz Michal Karpinski, Mireille Richard-Plouet
Publikováno v:
Solar Energy Materials and Solar Cells
Solar Energy Materials and Solar Cells, Elsevier, 2013, 116, pp.27. ⟨10.1016/j.solmat.2013.04.006⟩
Solar Energy Materials and Solar Cells, 2013, 116, pp.27. ⟨10.1016/j.solmat.2013.04.006⟩
Solar Energy Materials and Solar Cells, Elsevier, 2013, 116, pp.27. ⟨10.1016/j.solmat.2013.04.006⟩
Solar Energy Materials and Solar Cells, 2013, 116, pp.27. ⟨10.1016/j.solmat.2013.04.006⟩
International audience; We describe a one-pot chemical synthesis to produce TiO2−x(OH)2x colloidal solutions that are suitable to be deposited, at 150 °C only, as interfacial electron transporting layer, in inverted organic solar cells. The crysta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::09760ca4a99a7c76cef6c2b3d4f9c703
https://hal.archives-ouvertes.fr/hal-00950595
https://hal.archives-ouvertes.fr/hal-00950595
Autor:
A. Ferrec, N. Ouldhamadouche, Pierre-Yves Jouan, Linda Cattin, Arkadiusz Michal Karpinski, M. A. Djouadi, Luc Brohan, Mireille Richard-Plouet
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2011, 519 (17), pp.5767. ⟨10.1016/j.tsf.2010.12.203⟩
Thin Solid Films, Elsevier, 2011, 519 (17), pp.5767. ⟨10.1016/j.tsf.2010.12.203⟩
International audience; In this paper, we characterize high transparency p-type semiconducting NiO thin films deposited by Direct Current Reactive Magnetron Sputtering from a pure Ni target in a mixture of oxygen and argon gases on Corning glass/SnO2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::473541d06e379f3ce0dd4b341e3a9ded
https://hal.archives-ouvertes.fr/hal-00849612
https://hal.archives-ouvertes.fr/hal-00849612