Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Arindom Goswami"'
Autor:
John W. Rumsey, Case Lorance, Max Jackson, Trevor Sasserath, Christopher W. McAleer, Christopher J. Long, Arindom Goswami, Melissa A. Russo, Shruti M. Raja, Karissa L. Gable, Doug Emmett, Lisa D. Hobson‐Webb, Manisha Chopra, James F. Howard, Jeffrey T. Guptill, Michael J. Storek, Miguel Alonso‐Alonso, Nazem Atassi, Sandip Panicker, Graham Parry, Timothy Hammond, James J. Hickman
Publikováno v:
Adv Ther (Weinh)
Chronic autoimmune demyelinating neuropathies are a group of rare neuromuscular disorders with complex, poorly characterized etiology. Here we describe a phenotypic, human-on-a-chip (HoaC) electrical conduction model of two rare autoimmune demyelinat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0e1c1dbc945b9d3fe2e8b4e7d5ec6672
https://europepmc.org/articles/PMC9540753/
https://europepmc.org/articles/PMC9540753/
Publikováno v:
ACS Chemical Neuroscience. 11:1085-1092
Human-based "body-on-a-chip" technology provides powerful platforms in developing models for drug evaluation and disease evaluations in phenotypic models. Induced pluripotent stem cells (iPSCs) are ideal cell sources for generating different cell typ
Autor:
Carlota Oleaga, Andrea Lavado, Anne Riu, Sandra Rothemund, Carlos A. Carmona‐Moran, Keisha Persaud, Andrew Yurko, Jennifer Lear, Narasimhan Sriram Narasimhan, Christopher J. Long, Frank Sommerhage, Lee Richard Bridges, Yunqing Cai, Candace Martin, Mark T. Schnepper, Arindom Goswami, Reine Note, Jessica Langer, Silvia Teissier, José Cotovio, James J. Hickman
Publikováno v:
Adv Funct Mater
The goal of human-on-a-chip systems is to capture multi-organ complexity and predict the human response to compounds within physiologically relevant platforms. The generation and characterization of such systems is currently a focal point of research
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56649b7db9cc01f84898d059830af096
https://europepmc.org/articles/PMC9113405/
https://europepmc.org/articles/PMC9113405/
Publikováno v:
ACS Applied Materials & Interfaces. 7:5051-5055
In this study, we report the first chemical characterization of a plasma-deposited model fluoropolymer on low-k dielectric nanostructure and its decomposition in UV/O2 conditions. Carbonyl incorporation and progressive removal of fluorocarbon fragmen
Publikováno v:
ECS Journal of Solid State Science and Technology. 3:P293-P297
In microelectronics fabrication, post chemical mechanical polishing (CMP) cleaning is required to remove organic contaminants and particles left on copper interconnects after the CMP process. Use of cleaning solutions, however, causes serious reliabi
Autor:
Tamal Mukherjee, Yuki Chiba, Joshua Stillahn, Jafar I. Abdelghani, Kaoru Maekawa, Arindom Goswami, Oliver Chyan, Sirish Rimal
Publikováno v:
ECS Solid State Letters. 3:N1-N4
Plasma etch damage is the main cause of dielectric degradation of porous low-k materials during fabrication of advanced Cu/low-k interconnects. Highly energetic ions, reactive radicals and vacuum ultraviolet radiation generated during plasma etching
Publikováno v:
ECS Meeting Abstracts. :2283-2283
In leading edge integrated circuit manufacture, reduction of RC time delay by incorporation of porous ultra-low k (ULK) interlayer dielectrics (ILD) into Cu interconnect nanostructure continues to pose major integration challenges. The main challenge
Publikováno v:
ECS Meeting Abstracts. :1073-1073
Ru and other noble metals have been actively investigated for use as seedless liner/barrier materials for advanced Cu interconnect applications. Due to the lack of volatile byproducts in the reactive ion etching of Cu, the Cu interconnects are fabric
Autor:
Tamal Mukherjee, Kaoru Maekawa, Sirish Rimal, Arindom Goswami, Oliver Chyan, Yuki Chiba, Joshua Stillahn, Jafar I. Abdelghani
Publikováno v:
ECS Solid State Letters. 3:X1-X1