Zobrazeno 1 - 10
of 49
pro vyhledávání: '"Aranka Derzsi"'
Autor:
Li Wang, Máté Vass, Zoltán Donkó, Peter Hartmann, Aranka Derzsi, Yuan-Hong Song, Julian Schulze
Publikováno v:
Plasma Sources Science and Technology. 31:06LT01
The magnetized drift-ambipolar (‘m-DA’) electron power absorption mode and a sequence of structural transitions, including the formation of an electropositive core where the electron density is much higher than the negative ion density, are ident
Evolution of the bulk electric field in capacitively coupled argon plasmas at intermediate pressures
Publikováno v:
Plasma Sources Science and Technology. 31:045017
The physical characteristics of an argon discharge excited by a single-frequency harmonic waveform in the low-intermediate pressure regime (5–250 Pa) are investigated using particle-in-cell/Monte Carlo collisions simulations. It is found that, when
Autor:
Peter Hartmann, Máté Vass, Aranka Derzsi, Zoltan Donko, Julian Schulze, Li Wang, Yuan-Hong Song
Publikováno v:
Plasma Sources Science and Technology. 30:10LT01
External magnetic fields impose diverse effects on low-temperature plasmas. We study these in a low-pressure capacitively coupled radio frequency plasma in argon via self-consistent kinetic simulations. The primary effect of the transversal magnet
Publikováno v:
Plasma Sources Science and Technology. 30:105003
Publikováno v:
Computer Physics Communications. 263:107913
In this paper, we describe an efficient, massively parallel GPU implementation strategy for speeding up one-dimensional electrostatic plasma simulations based on the Particle-in-Cell method with Monte-Carlo collisions. Relying on the Roofline perform
Publikováno v:
Plasma Sources Science and Technology. 30:03LT04
We present a detailed analysis of electron trajectories within the sheath regions of capacitively coupled plasmas excited by radio-frequency voltage waveforms at low pressures. Complex features inside the sheaths are identified in several physical qu
Autor:
Zoltan Juhasz, Aranka Derzsi, Zoltan Donko, Eunwoo Lee, Peter Hartmann, Sebastian Wilczek, K Nösges, Julian Schulze, Thomas Mussenbrock, Birk Berger, Li Wang, Ralf Peter Brinkmann
Publikováno v:
Plasma Sources Science and Technology. 29:075014
In high aspect ratio (HAR) dielectric plasma etching, dual-frequency capacitively coupled radio-frequency plasmas operated at low pressures of 1 Pa or less are used. Such plasma sources are often driven by a voltage waveform that includes a low-frequ
We investigate the energy and angular distributions of the ions reaching the electrodes in low-pressure, capacitively coupled oxygen radio-frequency discharges. These distributions, as well as the possibilities of the independent control of the ion f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8466024c3c33f0b2ba4630cfcf147a67
http://arxiv.org/abs/1809.06779
http://arxiv.org/abs/1809.06779
Autor:
Manaswi Daksha, Birk Berger, Julian Schulze, Aranka Derzsi, Ihor Korolov, Edmund Schuengel, Mark Koepke, Zoltan Donko
Publikováno v:
2016 IEEE International Conference on Plasma Science (ICOPS).
A Computationally Assisted Spectroscopic Technique to measure secondary electron emission coefficients (γ-CAST) in capacitively coupled radio-frequency plasmas is proposed. This non-intrusive, sensitive diagnostic is based on a combination of Phase
Autor:
Timo Gans, Julian Schulze, Jean-Paul Booth, Thomas Mussenbrock, Steven Brandt, Birk Berger, J.B. Franek, Edmund Schuengel, Erik Johnson, Ihor Korolov, Zoltan Donko, Mark Koepke, Trevor Lafleur, Bastien Bruneau, Aranka Derzsi, Deborah O'Connell
Publikováno v:
2016 IEEE International Conference on Plasma Science (ICOPS).
The spatio-temporal electron impact excitation dynamics in a capacitively coupled RF discharge driven by tailored voltage waveforms in Ar and CF4 are investigated experimentally and by PIC simulations. In the experiment, the discharge is driven by up