Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Arame Thiam"'
Autor:
Ciré Ndiaye, Mame Sanou Diouf, Houra Ahmed, Arame Thiam, Ngoné Diaba Diop, Aminata Mbaye, Mamadou Woury Barry, Mame Diarra Bousso Ba
Publikováno v:
Case Reports in Otolaryngology, Vol 2024 (2024)
Pleomorphic adenoma is a benign tumor of the salivary glands. It develops preferentially in the parotid gland. The authors report a localization of a pleomorphic adenoma on the palate and discuss the value of CT scan in therapeutic strategy.
Externí odkaz:
https://doaj.org/article/2cb895ded0764fb289266c7687f0feb7
Autor:
Seiji Nagahara, Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine, Makoto Muramatsu, Satoru Shimura, Atsushi Tsuboi, Kathleen Nafus, Yannick Feurprier, Marc Demand, Rajesh Ramaneti, Philippe Foubert, Danilo De Simone, Geert Vandenberphe
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Ankit Pokhrel, Giulio Marti, Martin O'Toole, Gayle Murdoch, Anshul Gupta, Stefan Decoster, Souvik Kundu, Elisabeth Camerotto, Quoc Toan Le, Arame Thiam, Alicja Lesniewska, Seongho Park, Zsolt Tokei
Publikováno v:
2022 IEEE International Interconnect Technology Conference (IITC).
Autor:
Pieter Wöltgens, Alberto Colina, David Rio, Maxence Delorme, Tatiana Kovalevich, Arame Thiam, Frieda van Roey, Odysseas Zografos
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Filip Schleicher, Joost Bekaert, Arame Thiam, Stefan Decoster, Romuald Blanc, Frédéric Lazzarino, Jara Garcia-Santaclara, Gijsbert Rispens, Mark Maslow
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XI.
Autor:
Quentin Smets, Tom Schram, Devin Verreck, Daire Cott, Benjamin Groven, Zubair Ahmed, Ben Kaczer, Jerome Mitard, Xiangyu Wu, Souvik Kundu, Hans Mertens, Dunja Radisic, Arame Thiam, Waikin Li, Emmanuel Dupuy, Zheng Tao, Kevin Vandersmissen, Thibaut Maurice, Dennis Lin, Pierre Morin, Inge Asselberghs, Iuliana Radu
Publikováno v:
2021 IEEE International Electron Devices Meeting (IEDM)
Autor:
Negin Golshani, Thomas Witters, John McGurk, Peter De Heyn, Jeroen De Coster, Alexey Milenin, Arame Thiam, Andrea Mingardi, Peter Verheyen, Marianna Pantouvaki, Joris Van Campenhout
Publikováno v:
2021 IEEE 17th International Conference on Group IV Photonics (GFP).
Autor:
Nadia Zuurbier, Gijsbert Rispens, Arame Thiam, Rik Hoefnagels, Fong Choi Yin, Joost Bekaert, Mark John Maslow, Lidia van Lent-Protasova, Jara Garcia Santaclara
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
As feature sizes continue to shrink, low k1 lithographic processes are required to advance chip technologies. To achieve actual gains in resolution, both the advances in optical systems and imaging capabilities, as well as the improvements in EUV mat
Autor:
Danny Wan, Sebastien Couet, Xiaoyu Pao, Laurent Souriau, Diana Tsvetanova, Diziana Vangoidsenhoven, Arame Thiam, Antoine Pacco, Anton Potocnik, Massimo Mongillo, Tsvetan Ivanov, Julien Jussot, Jeroen Verjauw, Rohith Acharya, Jeroen Heijlen, GabrieleLuca Donadio, Bogdan Govoreanu, Frederic Lazzarino, Iuliana Radu
Publikováno v:
Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials.
Autor:
Nancy C. Chescheir, César Francisco Saldaña-Solórzano, Sarah Bundrick Grimes, Arame Thiam Diouf
Publikováno v:
Obstetrics & Gynecology. 136:420-421