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pro vyhledávání: '"Apollo Marmarinos"'
Autor:
Cheuk Wun Wong, Taher Kagalwala, Tam Vuong, Neelima Rathi, Patrick Snow, Karsten Gutjahr, Gorby Wan, Tony Joung, Apollo Marmarinos
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
This paper presents a new overlay metrology target design and scheme referred as MoireOVLTM. It utilizes Moire patterns of two overlapping gratings to amplify the kernel response to overlay misalignment and thereby has the potential to enhance kernel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3cd3e79ed70a25aba6506919e9201bb
https://doi.org/10.1117/12.2583733
https://doi.org/10.1117/12.2583733
