Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Apo Sezginer"'
Publikováno v:
SPIE Proceedings.
Mask Process Compensation (MPC) corrects proximity effects arising from e-beam lithography and plasma etch processes that are used in the photomask manufacturing. Accurate compensation of the mask process requires accurate, predictive models of the m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36fa938802bc2ce6d40a6ad47746fd66
https://doi.org/10.1117/12.833485
https://doi.org/10.1117/12.833485
Publikováno v:
SPIE Proceedings.
We present a model-based method of generating and optimizing sub-resolution assist features. Assist feature generation is based on a focus sensitivity map derived from a cost function that minimizes the variations in the printed pattern with respect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12d83c98dc022e5e4eaeac25fa2545a2
https://doi.org/10.1117/12.829938
https://doi.org/10.1117/12.829938
Publikováno v:
SPIE Proceedings.
We quantify the OPC accuracy improvement obtained by including the stepper signatures in the OPC model. The analysis takes into account the complete cycle of OPC model calibration, OPC execution, and image verification of the OPCed photomask. We use
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5026a8dd32b84a058dcc64f04cbb212f
https://doi.org/10.1117/12.824277
https://doi.org/10.1117/12.824277
Autor:
Justin Ghan, Apo Sezginer
Publikováno v:
SPIE Proceedings.
An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2d102eb443eecfa0c7ce9977142b270
https://doi.org/10.1117/12.814321
https://doi.org/10.1117/12.814321
Autor:
Michiel Victor Paul Kruger, Vishnu Kamat, Marc D. Himel, Bayram Yenikaya, Jared D. Stack, Apo Sezginer, Tamer H. Coskun, James Carriere
Publikováno v:
SPIE Proceedings.
We present a method for optimizing a free-form illuminator implemented using a diffractive optical element (DOE). The method, which co-optimizes the source and mask taking entire images of circuit clips into account, improves the common process-windo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46dc8493ff71f39930ce9b2e6449b2fc
https://doi.org/10.1117/12.814215
https://doi.org/10.1117/12.814215
Autor:
Jesus Carrero, Alan Zhu, Katsuyuki Miyoko, Yoshimitsu Okuda, Gökhan Perçin, Apo Sezginer, Kiyoshi Kageyama, Anwei Liu
Publikováno v:
SPIE Proceedings.
In recent years, mask critical dimension (CD) linearity and uniformity has become increasingly important. The ITRS roadmap shows the mask CD control requirements exceeding those of the wafer side beyond the 45nm node. Measurements show that there are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d17211f9700a8fb6c2ead7dabc48cb0
https://doi.org/10.1117/12.746796
https://doi.org/10.1117/12.746796
Publikováno v:
SPIE Proceedings.
We consider a memory device that is printed by double patterning (litho-etch-litho-etch) technology wherein positive images of 1/4-pitch lines are printed in each patterning step. We analyze the errors that affect the width of the spaces. We propose
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b28fe5263a0a186d6876041bbc37063
https://doi.org/10.1117/12.729011
https://doi.org/10.1117/12.729011
Autor:
Apo Sezginer, Bayram Yenikaya
Publikováno v:
SPIE Proceedings.
We present a necessary condition for an arbitrary 2-dimensional pattern to be printable by optical projection lithography. We call a pattern printable if it satisfies a given set of edge-placement tolerances for a given lithography model and process-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5837b48e1a5b46d0d5b745c95c568e43
https://doi.org/10.1117/12.711530
https://doi.org/10.1117/12.711530
Autor:
Apo Sezginer, Bayram Yenikaya
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d07b3f2650dd46f69344e0057544bb4d
https://doi.org/10.1117/12.711515
https://doi.org/10.1117/12.711515
Autor:
Vishnu Kamat, Hsu-Ting Huang, Apo Sezginer, Ali Mokhberi, Jesus Carrero, Gökhan Perçin, Franz X. Zach
Publikováno v:
SPIE Proceedings.
We present a methodology for building through-process, physics-based litho and etch models which result in accurate and predictive models. The litho model parameters are inverted using resist SEM data collected on a set of test-structures for a set o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb2ea43cb348b9801f87a4535b853fc3
https://doi.org/10.1117/12.692931
https://doi.org/10.1117/12.692931