Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Anthony Thio"'
Autor:
Julia D. Cushen, Sangwon Kim, Christopher M. Bates, Anthony Thio, Christopher J. Ellison, Frank S. Bates, C. Grant Willson
Publikováno v:
ACS Nano. 7:9905-9919
Two high-χ block copolymers, lamella-forming poly(styrene-block-[isoprene-random-epoxyisoprene]) (PS-PEI78, with 78 mol % epoxidation) and lamella-forming poly(4-trimethylsilylstyrene-block-d,l-lactide) (PTMSS-PLA), were used to study three combinat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cef094b21838d5ab81c1f26c6f3bd2de
https://doi.org/10.1021/nn403616r
https://doi.org/10.1021/nn403616r
Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications
Autor:
Sébastien Fort, Redouane Borsali, Cyrille Rochas, Issei Otsuka, Jeffrey A. Easley, Christopher J. Ellison, Anthony Thio, Julia D. Cushen, Christopher M. Bates, Sami Halila, Erica L. Rausch, C. Grant Willson
Publikováno v:
ACS Nano
ACS Nano, American Chemical Society, 2012, 6 (4), pp.3424-3433. ⟨10.1021/nn300459r⟩
ACS Nano, American Chemical Society, 2012, 6 (4), pp.3424-3433. ⟨10.1021/nn300459r⟩
Block copolymers demonstrate potential for use in next-generation lithography due to their ability to self-assemble into well-ordered periodic arrays on the 3-100 nm length scale. The successful lithographic application of block copolymers relies on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7e1059f9b32333af9559afa7565aae9f
https://hal.archives-ouvertes.fr/hal-02114592
https://hal.archives-ouvertes.fr/hal-02114592
Autor:
Leon M. Dean, Christopher J. Ellison, Anthony Thio, C. Grant Willson, Litan Li, Michael J. Maher, William J. Durand, Greg Blachut, Julia D. Cushen, Christopher M. Bates
Publikováno v:
Journal of Photopolymer Science and Technology. 26:223-224
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d87fbb243e97bac549b79b8137ca585b
https://doi.org/10.2494/photopolymer.26.223
https://doi.org/10.2494/photopolymer.26.223