Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Anthony S. Geller"'
Autor:
Sophia Arnauts, Sachin Attavar, Twan Bearda, Stephen P. Beaudoin, Jeffery W. Butterbaugh, Philip G. Clark, David A. Cole, Geert Doumen, John B. Durkee, Michael L. Free, Taketoshi Fujimoto, Wim Fyen, Anthony S. Geller, Kuniaki Gotoh, Aaron Harrison, Frank Holsteyns, Darby Hoss, Koji Kato, Karine Kenis, Rajiv Kohli, Jean L. Lee, Larry Levit, Chao-Hsin Lin, Wayne T. McDermott, Paul W. Mertens, Kashmiri L. Mittal, Tatsuo Nonaka, Othmar Preining, David J. Quesnel, Daniel J. Rader, Donald S. Rimai, David M. Schaefer, Robert Sherman, Arnold Steinman, Melissa Sweat, Kikuo Takeda, Myles Thomas, Joerg C. Tiller, Jan Van Steenbergen, Thomas J. Wagener, Zhong Lin Wang, Darren L. Williams, Lei Zhang, Chao Zhu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37b1f3628216a19f1764f5dc9d55fb0b
https://doi.org/10.1016/b978-0-323-29960-2.09996-2
https://doi.org/10.1016/b978-0-323-29960-2.09996-2
Publikováno v:
Aerosol Science and Technology. 36:251-266
Particle deposition resulting from uniform external forces and Brownian motion is modeled in a parallel-plate reactor geometry characteristic of a wide range of semiconductor process tools: uniform, isothermal, downward flow exiting a perforated-plat
Publikováno v:
Journal of Aerosol Science. 30:127-130
A boundary element formulation for implementation on computers with massively parallel architecture, which allows calculation of particle drag and torque for particle agglomerates, is described. Shape factors for long, linear chains of spheres transl
Autor:
Anthony S. Geller, Daniel J. Rader
Publikováno v:
Aerosol Science and Technology. 28:105-132
Particle deposition is modeled in a parallel-plate reactor geometry characteristic of a wide range of semiconductor process tools: uniform downward flow exiting a perforated-plate showerhead separated by a small gap from a circular wafer resting on a
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:660-665
An understanding of particle transport is necessary to reduce contamination of semiconductor wafers during low‐pressure processing. The trajectories of particles in these reactors are determined by external forces (the most important being neutral
Publikováno v:
Journal of Aerosol Science. 24:823-834
A computationally-efficient method is presented to calculate local particle concentration enhancements resulting from potential fluid flow around an idealized aircraft fuselage and wing. The geometries chosen for study are a 10:1 prolate ellipsoid at
Publikováno v:
Journal of Aerosol Science. 24:597-609
The utility of the boundary element technique is demonstrated on the problem of linear chains of spheres translating and rotating through a quiescent fluid. The method takes advantage of the linearity of the problem by using superposition of the gene
Autor:
Anthony S. Geller, Daniel J. Rader
Publisher Summary This chapter reviews the theoretical models available to describe particle transport in typical semiconductor processing environments. Particle concentrations are assumed to be low enough so that the influence of the particle on flu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f28f43b7a6690bf23aadf666f295451
https://doi.org/10.1016/b978-081551555-5.50005-8
https://doi.org/10.1016/b978-081551555-5.50005-8
Autor:
Anthony S. Geller, Daniel J. Rader, John R. Torczynski, Michael A. Gallis, Rudy F. Garcia, Gil Delgado, Leonard E. Klebanoff, Frank Chilese
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 33:031602
An analysis is presented of a method to protect the reticle (mask) in an extreme ultraviolet (EUV) mask inspection tool using a showerhead plenum to provide a continuous flow of clean gas over the surface of a reticle. The reticle is suspended in an