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Autor:
Joseph D. Sweeney, Richard S. Ray, Stephen Krause, Miller Timothy J, Ying Tang, John Koo, Anthony M. Avila, Min-Sung Jeon, Oleg Byl, Wesley Skinner, James Mullin
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT).
Ion implantation is known for its precise control and reproducibility of doping, enabling it to become one of the main approaches for high-efficiency cell manufacturing in the solar industry. Among the dopant materials, boron doping often represents