Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Anthony Keen"'
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3989cfb29d0ab4bd2d0f489f677fdf95
https://doi.org/10.1109/iwaps57146.2022.9972330
https://doi.org/10.1109/iwaps57146.2022.9972330
Publikováno v:
2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6e3c05e97b2bc8da1dd9c5236539a76
https://doi.org/10.1109/iwaps54037.2021.9671069
https://doi.org/10.1109/iwaps54037.2021.9671069
Publikováno v:
Applied Spectroscopy. 62:1354-1362
A continuous wave cavity ring-down (cw-CRD) spectrometer has been developed for the measurement of trace levels of water vapor by absorption spectroscopy at wavelengths in the vicinity of 1358 nm and 1392 nm. The speed of data acquisition and selecti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aa3100ac5047aa3c34dbbddaeb8ae23d
https://doi.org/10.1366/000370208786822142
https://doi.org/10.1366/000370208786822142
Autor:
David J. Watson, Georgios Kyriakou, Anthony Keen, Robert B. Grant, David J. Davis, Richard M. Lambert, Mintcho S. Tikhov
Publikováno v:
The Journal of Physical Chemistry C. 111:4491-4494
Carbonaceous deposits produced on Ru-capped multilayer mirrors under extreme ultraviolet (EUV) irradiation in the presence of adventitious gaseous hydrocarbons are a major obstacle to process implementation of EUV lithography, the key to fabrication
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf3b9b9640f6ba8a90b0ef514242c27a
https://doi.org/10.1021/jp070485e
https://doi.org/10.1021/jp070485e
Autor:
L. Rumiz, Kim Dean, Hiroaki Oizumi, Julia Simon, Heidi Cao, Takeo Watanabe, Wang Yueh, Paolo Lacovig, Gregory Denbeaux, Anthony Keen, Iwao Nishiyama
Optics contamination is a concern for extreme ultraviolet (EUV) lithography. To protect EUV optics, all materials used in EUV vacuum exposure chambers must be screened prior to use. Photoresists are a concern since a freshly coated wafer will be intr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a9e97daa5aa6cc48de39e212165dbb75
https://hdl.handle.net/11368/1689256
https://hdl.handle.net/11368/1689256
Autor:
Anthony Keen, Richard M. Lambert, David J. Davis, Philip Pakianathan, Georgios Kyriakou, Robert B. Grant, Mintcho S. Tikhov
Publikováno v:
The journal of physical chemistry. B. 110(48)
A potentiometric device based on interfacing a solid electrolyte oxygen ion conductor with a thin platinum film acts as a robust, reproducible sensor for the detection of hydrocarbons in high- or ultrahigh-vacuum environments. Sensitivities in the or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0a804dc858bd5f5645b50e75680af7ff
https://pubmed.ncbi.nlm.nih.gov/17134217
https://pubmed.ncbi.nlm.nih.gov/17134217
Publikováno v:
Applied Spectroscopy. Dec2008, Vol. 62 Issue 12, p1354-1362. 9p.