Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ankita Ganguly"'
Autor:
Mahima Arya, Ankita Ganguly, Gnanavel V. Krishnamurthy, Surya S. Rout, Leonid Gurevich, Tobias Krekeler, Martin Ritter, Kjeld Pedersen, Michael Störmer, Alexander Yu Petrov, Manfred Eich, Manohar Chirumamilla
Publikováno v:
Arya, M.; Ganguly, A.; Krishnamurthy, G.V.; Rout, S.S.; Gurevich, L.; Krekeler, T.; Ritter, M.; Pedersen, K.; Störmer, M.; Yu Petrov, A.; Eich, M.; Chirumamilla, M.: Which factor determines the optical losses in refractory tungsten thin films at high temperatures?. In: Applied Surface Science. Vol. 588 (2022) 152927. (DOI: /10.1016/j.apsusc.2022.152927)
Arya, M, Ganguly, A, Krishnamurthy, G V, Rout, S S, Gurevich, L, Krekeler, T, Ritter, M, Pedersen, K, Störmer, M, Yu Petrov, A, Eich, M & Chirumamilla, M 2022, ' Which factor determines the optical losses in refractory tungsten thin films at high temperatures? ', Applied Surface Science, vol. 588, 152927 . https://doi.org/10.1016/j.apsusc.2022.152927
Applied Surface Science 588: 152927 (2022-06-30)
Arya, M, Ganguly, A, Krishnamurthy, G V, Rout, S S, Gurevich, L, Krekeler, T, Ritter, M, Pedersen, K, Störmer, M, Yu Petrov, A, Eich, M & Chirumamilla, M 2022, ' Which factor determines the optical losses in refractory tungsten thin films at high temperatures? ', Applied Surface Science, vol. 588, 152927 . https://doi.org/10.1016/j.apsusc.2022.152927
Applied Surface Science 588: 152927 (2022-06-30)
Refractory tungsten (W) plays an important role in high temperature photonic/plasmonic applications. Previously room temperature bulk single/poly-crystalline optical constants were extensively used to calculate the optical properties of W nanostructu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::53b8081c88ff9f5ee2805437e3910524
https://publications.hereon.de/id/50516
https://publications.hereon.de/id/50516
Autor:
Martin Ritter, Duncan S. Sutherland, Gnanavel Vaidhyanathan Krishnamurthy, Alexander Petrov, Kjeld Møller Pedersen, S. S. Rout, Manohar Chirumamilla, Sergey I. Bozhevolnyi, Ankita Ganguly, Manfred Eich, Tobias Krekeler, Mahima Arya, Michael Störmer
Publikováno v:
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Titanium nitride (TiN) has emerged as one of the most promising refractory materials for plasmonic and photonic applications at high temperatures due to its prominent optical properties along with mechanical and thermal stability. From a high tempera
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Michael Störmer, Mahima Arya, Alexander Yu. Petrov, Manohar Chirumamilla, S. S. Rout, Ankita Ganguly, Martin Ritter, Manfred Eich, Tobias Krekeler
Publikováno v:
Technische Universität Hamburg
We measure and compare the optical properties of thin refractory metal films (TiN, W, Mo and Ir) at temperatures up to 1000 °C. In-situ ellipsometry is used to measure the optical constants. Refractory metals show long-term structural stability at 1