Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Anita Bouma"'
Autor:
Seung-Uk Jeong, Sotirios Tsiachris, Jeongwoo Jae, Dongyoung Lee, Chih-Hung Hsieh, Gwang-Gon Kim, Yuna Park, Ji-Hoon Jung, Kyoyeon Cho, Abdalmohsen Elmalk, Chanha Park, Nang-Lyeom Oh, Taekwon Jee, Gratiela Isai, Jungchan Kim, JaeYoung Park, Won-Kwang Ma, Ewa Kasperkiewicz, Rizvi Rahman, Anita Bouma, Sang Ho Lee, WeiTai Lin, Kuo-Feng Pao, Jae-Doug Yoo, Jonggeun Won, Sudharshanan Raghunathan, Hsin-Yu Chen, Kuan-Ming Chen, Sang-Woo Kim, Wolfgang Henke
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
In this paper, budget characterization and wafer mapping of the Edge Placement Error (EPE) is studied to manage and improve pattern defects with a use case selected from SK Hynix’s most advanced DRAM 1x nm product. To quantify EPE, CD and overlay w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6cfb49bf9cac2960cff0b63d8a25e234
https://doi.org/10.1117/12.2584149
https://doi.org/10.1117/12.2584149
Autor:
Bart Smeets, Lei Zhang, Anita Bouma, Peter de Loijer, Willem van Mierlo, Wendy Liebregts, Bart Rijpers, Tran Thanh Thuy Vu, Goosen Maikel Robert
Publikováno v:
Optical Microlithography XXXI.
Scanner induced pattern shifts between layers are a large contributor to DRAM Bitline to Active overlay. One of the main root causes for this Pattern Shift non-Uniformity are lens aberrations. Currently measuring the Bitline to Active overlay require
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f8ce890664c52df2d8b6c4025944e36
https://doi.org/10.1117/12.2304364
https://doi.org/10.1117/12.2304364
Autor:
Anita Bouma, Holger Schönherr, Jürgen Schnekenburger, Chuanliang Feng, G. Julius Vancso, Wolfram Domschke, Maria F. Garcia-Parajo, Anika Embrechts, Ilona Bredebusch
Publikováno v:
European polymer journal, 43(6), 2177-2190. Elsevier
Thin spin-coated films of polystyrene-block-poly(tert-butyl acrylate) (PS690-b-PtBA1210) on various substrates are introduced as versatile, robust reactive platform for the immobilization of (bio)molecules for the fabrication of tailored biointerface
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bcea8ac48937f424027832def56c2219
https://doi.org/10.1016/j.eurpolymj.2007.03.021
https://doi.org/10.1016/j.eurpolymj.2007.03.021
Autor:
Tarik Meziani, Anita Bouma, François Rossi, Pascal Colpo, Frédéric Bretagnol, Maria F. Garcia-Parajo, Michaël Lejeune, Andrea Valsesia
Publikováno v:
Advanced functional materials, 16(9), 1242-1246. Wiley-VCH Verlag
A method for fabricating chemically nanopatterned surfaces based on a combination of colloidal lithography and plasma- enhanced chemical vapor deposition (PECVD) is presented. This method can be applied for the creation of different nanopatterns, and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d0477fc60120caec4eb184f2f2ad4af
https://doi.org/10.1002/adfm.200500653
https://doi.org/10.1002/adfm.200500653
Publikováno v:
SPIE Proceedings.
In our study we have investigated the mask 3D impact on best focus (BF) shifts, which may occur on more complex 2D patterns, by looking at simplified line/space test patterns at various pitches. Several test masks were created; with different absorbe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::011d94eb6e0c882d56006517f5e5aeba
https://doi.org/10.1117/12.2068155
https://doi.org/10.1117/12.2068155
Autor:
A. Ngai, C. Toma, Junji Miyazaki, Brid Connolly, J. van Praagh, Ilan Englard, Yosuke Kojima, Yaron Cohen, Karine Jullian, Kees Grim, Masaru Higuchi, Michael Ben Yishai, Jo Finders, Shmoolik Mangan, Orion Mouraille, Anita Bouma
Publikováno v:
SPIE Proceedings.
In this paper we compare the imaging properties of lithographic test structures formed on test masks with different reticle absorbers for use in1.35 NA immersion lithography. We will look into different aspects like process windows and CD fingerprint
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd4ec07f4c31b0ba3fa2853eadc964b3
https://doi.org/10.1117/12.918018
https://doi.org/10.1117/12.918018
Autor:
Christoph Hennerkes, Joerg Zimmermann, Mircea Dusa, Robert John Socha, Joost Bekaert, Stanislas Baron, Darko Trivkovic, Anita Bouma, E. van der Heijden, L. Van Look, Kram Koen Schreel, Paul Gräupner, Hua-yu Liu, Frederic Lazzarino, Stephen Hsu, K. Ning, Bart Laenens, Melchior Mulder, J. T. Neumann, Min-Chun Tsai, Orion Mouraille, P. van Adrichem, Geert Vandenberghe, Staf Verhaegen, Jozef Maria Finders
Publikováno v:
SPIE Proceedings.
The use of customized illumination modes is part of the pursuit to stretch the applicability of immersion ArF lithography. Indeed, a specific illumination source shape that is optimized for a particular design leads to enhanced imaging results. Recen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::198b332a92a697d480e57358a4e3ff63
https://doi.org/10.1117/12.846918
https://doi.org/10.1117/12.846918
Autor:
Joost Bekaert, Dirk Jürgens, Gert Streutker, Wilfred Endendijk, J. Verbeeck, Robert John Socha, Andre Engelen, Bert van Drieenhuizen, Daniel Corliss, Melchior Mulder, Anita Bouma, Cas Johannes Petrus Maria Van Nuenen, Greg McIntyre, Bastian Trauter, Oscar Noordman, Joerg Zimmermann, Robert Kazinczi, Bart Laenens, Wim Bouman
Publikováno v:
SPIE Proceedings.
This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::156a83ca3e2ac3da0d5d3302a3f396f2
https://doi.org/10.1117/12.845984
https://doi.org/10.1117/12.845984
Autor:
Steve Hansen, Igor Bouchoms, Melchior Mulder, Jörg Zimmermann, Anthony Ngai, Marieke van Veen, Anita Bouma, Andre Engelen
Publikováno v:
SPIE Proceedings.
The practical limit of NA using water as immersion liquid has been reached. As a consequence, the k1 in production for the coming technology nodes will decrease rapidly, even below k1=0.25.This means that new imaging solutions are required. Double pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07cfaf12daa434f3440a65e83f7d781a
https://doi.org/10.1117/12.814155
https://doi.org/10.1117/12.814155