Zobrazeno 1 - 10
of 27
pro vyhledávání: '"Aniruddh Bahadur Yadav"'
Autor:
Aniruddh Bahadur Yadav, N. V. L. Narasimha Murty, Bandaru Lasya, Sreenivasulu Mamilla, Basavaraj S. Sannakashappanavar
Publikováno v:
Journal of Electronic Materials. 52:3228-3241
Autor:
Harsha Sai Kalyanapu, Nanda Gopal Vemuri, Venkata Pavan Sai Hemanth Rayapati, Aniruddh Bahadur Yadav, Gnana Prasanna Yella
Publikováno v:
2023 2nd International Conference for Innovation in Technology (INOCON).
Publikováno v:
Micro and Nanostructures. 179:207581
Autor:
Kunal Singh, Aniruddh Bahadur Yadav, Vinod Kumar, Basavaraj S. Sannakashappanavar, N. V. L. Narasimha Murty
Publikováno v:
Silicon. 14:1531-1536
A high performance electronic device can be fabricated by achieving a high quality metal thin film Ohmic contact to intrinsic ZnO. In the present work, the low specific contact resistance Cr/Au metallization scheme deposited on n-type intrinsic 100 n
Autor:
RadhaKrishna K Bhagavan NagaSai, B Suvarna Pooja, K Meher Preethi, R Sahithi Arjun, Aniruddh Bahadur Yadav
Publikováno v:
2022 IEEE International Conference on Nanoelectronics, Nanophotonics, Nanomaterials, Nanobioscience & Nanotechnology (5NANO).
Autor:
C. R. Byrareddy, N. V. L. Narasimha Murty, Aniruddh Bahadur Yadav, Basavaraj S. Sannakashappanavar
Publikováno v:
Journal of Electronic Materials. 49:5272-5280
The present study illustrates the fabrication of ZnO ultra-thin film (25 nm)-based bottom gate phototransistors using RF sputtering and thermal evaporation on SiO2/Si substrate for UV detection. According to the literature, phototransistors have the
Publikováno v:
Thin Solid Films. 685:343-352
Here we present the effect of the precursor chemistry on the properties of ZnO nanorods prepared by using the hydrothermal method. The nanorods were grown over RF-sputtered 50 nm ZnO seed layers on integrated circuits compatible highly lattice mismat
Autor:
Sublania Harish Kumar, Satyabrata Jit, Aniruddh Bahadur Yadav, Pramod Kumar Tiwari, Kunal Singh, Sarvesh Dubey
Publikováno v:
Journal of Electronic Materials. 48:6366-6371
In this work, a recent device structure called double-gate (DG) nanoscale RingFET has been investigated by developing a computationally efficient foremost semianalytical threshold voltage model. Poisson’s equation has been solved using parabolic ap
Autor:
Nandini A. Pattanashetti, Kunal Singh, C. R. Byrareddy, Basavaraj S. Sannakashappanavar, Aniruddh Bahadur Yadav
Publikováno v:
Journal of Nanoelectronics and Optoelectronics. 14:964-971
Publikováno v:
Materials Today Communications. 31:103751