Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Aneek James"'
Autor:
Anthony Rizzo, Stuart Daudlin, Asher Novick, Aneek James, Vignesh Gopal, Vaishnavi Murthy, Qixiang Cheng, Bok Young Kim, Xingchen Ji, Yoshitomo Okawachi, Matthew van Niekerk, Venkatesh Deenadayalan, Gerald Leake, Michael Fanto, Stefan Preble, Michal Lipson, Alexander Gaeta, Keren Bergman
Publikováno v:
IEEE Journal of Selected Topics in Quantum Electronics. 29:1-20
Autor:
Keren Bergman, Maarten Hattink, Kaylx Jang, Robert Parsons, Anthony Rizzo, Asher Novick, Aneek James
The use of chip-based micro-resonator Kerr frequency combs in conjunction with dense wavelength-division multiplexing (DWDM) enables massively parallel intensity-modulated direct-detection (IM-DD) data transmission with low energy consumption. Resona
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9c5ce66cf9c8984da669889274042a6e
https://doi.org/10.1364/opticaopen.22557658.v2
https://doi.org/10.1364/opticaopen.22557658.v2
Autor:
Yuyang Wang, Songli Wang, Asher Novick, Aneek James, Robert Parsons, Anthony Rizzo, Keren Bergman
Publikováno v:
2023 Optical Fiber Communications Conference and Exhibition (OFC).
We present a measurement-validated design methodology for engineering the width of silicon-on-insulator waveguides for co-optimized group velocity dispersion and fabrication robustness, paving the way for ultra-broadband dense wavelength-division mul
Autor:
Asher Novick, Kaylx Jang, Anthony Rizzo, Aneek James, Utsav Dave, Michal Lipson, Keren Bergman
Publikováno v:
2023 Optical Fiber Communications Conference and Exhibition (OFC).
We demonstrate a CMOS-foundry compatible, broadband, and compact platform for routing multimode wavguides. Insertion loss of R eff < 3µm bends supporting over 200nm of bandwidth.
Autor:
Aneek James, Anthony Rizzo, Yuyang Wang, Asher Novick, Songli Wang, Robert Parsons, Kaylx Jang, Maarten Hattink, Keren Bergman
We report a novel process variation-aware compact model of strip waveguides that is suitable for circuit-level simulation of waveguide-based process design kit (PDK) elements. The model is shown to describe both loss and -- using a novel expression f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3b973fcb120c647ef21322440c8a522
Publikováno v:
2022 International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD).
Autor:
Anthony Rizzo, Utsav Dave, Asher Novick, Alexandre Freitas, Samantha P. Roberts, Aneek James, Michal Lipson, Keren Bergman
Perturbations to the effective refractive index from nanometer-scale fabrication variations in waveguide geometry plague high index-contrast photonic platforms; this includes the ubiquitous sub-micron silicon-on-insulator (SOI) process. Such variatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ddc221d67cc381fed3acc49d2da5715b