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Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP.

Autor: Carlström, C. F., Van der Heijden, R., Andriesse, M. S. P., Karouta, F., Van der Heijden, R. W., Van der Drift, E., Salemink, H. W. M.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Sep/Oct2008, Vol. 26 Issue 5, p1675-1683, 9p, 6 Black and White Photographs, 1 Diagram, 1 Chart, 4 Graphs

High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

Autor: Andriesse, M. S. P., van der Drift, E., Sloof, W. G.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 6, p2901-2905, 5p

Periodic oscillations of the critical temperature versus the applied magnetic flux in a four-terminal SQUID

Autor: Vleeming, B. J., Andriesse, M. S. P., Brink, A. M. Van den, Dekker, H., Ouboter, R. De Bruyn

Publikováno v: Physica B: Condensed Matter; 1997, Vol. 239 Issue: 3 p216-222, 7p