Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Andrew Zanzal"'
Autor:
Bryan S. Kasprowicz, Patrick Reynolds, Martin Carrier, Siamak Mogharrabi, Corey Shay, Andrew Zanzal, Keith Best
Publikováno v:
2020 International Wafer Level Packaging Conference (IWLPC).
In the next few years, advanced process technologies in advanced packaging fabs will migrate rapidly to reduction lithography to achieve 2/2 RDL and beyond. Reticle enhancement techniques, such as Optical Proximity Correction (OPC) may be required in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46429a5a8c2d2daec6eb078a3446b44e
https://doi.org/10.23919/iwlpc52010.2020.9375898
https://doi.org/10.23919/iwlpc52010.2020.9375898
Autor:
Yuqiang Tu, Patrick Reynolds, David K. Poon, James M. Dykes, Jimmy T. K. Tsui, Jun Wang, Chinheng Choo, Glenn H. Chapman, Andrew Zanzal
Publikováno v:
SPIE Proceedings.
Recent work has shown that bimetallic films, such as Bi/In and Sn/In, can create laser direct-write grayscale photomasks. Using a laser-induced oxidation process; bimetallic films turn transparent with variations in optical transparency that are a fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5021131adce8c46b1f43b20f2f69461
https://doi.org/10.1117/12.686599
https://doi.org/10.1117/12.686599
Autor:
Jacques Beauvais, Kien Mun Lau, Teodor Veres, Andrew Zanzal, Bo Cui, Eric Lavallee, Dominique Drouin
Publikováno v:
SPIE Proceedings.
Nano-Imprint lithography has garnered much interest in the microlithography and nano-fabrication communities, and appears on the ITRS as a possible future lithography solution. The promise of this approach includes realization of ultimately finer fea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f95581fe7d0399eb693903f0d9919c64
https://doi.org/10.1117/12.599795
https://doi.org/10.1117/12.599795
Publikováno v:
SPIE Proceedings.
Proximity effects during electron beam exposure have been kept under control by using sophisticated correction algorithms and software, combined with a strategy which aims at increasing the electron beam energy to 50 keV and 100 keV. At these energie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3b86d7cde14f9e2826d716620faa5d2
https://doi.org/10.1117/12.599723
https://doi.org/10.1117/12.599723
Autor:
Andrew Zanzal
Publikováno v:
Handbook of Photomask Manufacturing Technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0afc34ebd773d7017b58729e33e35a20
https://doi.org/10.1201/9781420028782.ch1
https://doi.org/10.1201/9781420028782.ch1
