Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Andrew M. Hawryluk"'
Autor:
Andrew M. Hawryluk, Emily M. True
The objective of this activity was to address the need for improved manufacturing tools for LEDs. Improvements include lower cost (both capital equipment cost reductions and cost-ofownership reductions), better automation and better yields. To meet t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2da4048c03b39dadebd4866647fb349
https://doi.org/10.2172/1067464
https://doi.org/10.2172/1067464
Autor:
Diane Stewart, Andrew M. Hawryluk
Publikováno v:
Applied optics. 32(34)
We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8be83c071f6b221ab81d2cb8ea5a1b9
https://pubmed.ncbi.nlm.nih.gov/20856560
https://pubmed.ncbi.nlm.nih.gov/20856560
Publikováno v:
Applied optics. 32(34)
We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system. Other
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9105b1391f1effa197af39e464055785
https://pubmed.ncbi.nlm.nih.gov/20856566
https://pubmed.ncbi.nlm.nih.gov/20856566
Publikováno v:
Optics letters. 13(4)
We report an explicit demonstration of classical guided-wave propagation at XUV and soft-x-ray wavelengths. Experiments were performed using narrow-band synchrotron radiation at 5, 20.8, 21, and 30 nm. Free-standing gold transmission gratings served
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d3243163c447ba89eef871ab2b4670e
https://pubmed.ncbi.nlm.nih.gov/19745868
https://pubmed.ncbi.nlm.nih.gov/19745868
Publikováno v:
Optics letters. 13(2)
We report the first demonstration to our knowledge of multipass amplification of soft x rays. A gain medium of neonlike selenium ions was placed within a resonant cavity composed of a multilayer mirror and a beam splitter designed for normal-incidenc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5b5b1f2e858cb54053ec91ba411bdf6d
https://pubmed.ncbi.nlm.nih.gov/19741996
https://pubmed.ncbi.nlm.nih.gov/19741996
Autor:
Andrew M. Hawryluk, Daniel P. Ceperley, Xiaoru Wang, Yun Wang, Michael Shen, Andrew R. Neureuther
Publikováno v:
2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors.
Finite difference time domain simulation of the electromagnetic coupling in millisecond radiation heating is used to explore how the energy couples, where it goes in the device structure, and wavelength dependencies. Millisecond annealing is advantag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9047d26ca14b0e7daac1560cd4601e0a
https://doi.org/10.1109/rtp.2008.4690557
https://doi.org/10.1109/rtp.2008.4690557
Publikováno v:
Extreme Ultraviolet Lithography (TOPS).
The key issues in reticle manufacturing are cost and delivery time, both of which are dependent upon the yield of the process line. To estimate the cost and delivery time for EUVL reticles in commercial manufacturing, we have developed the first mode
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9c2eccaabc4fe2a666b01f48c6401dd
https://doi.org/10.1364/eul.1996.r54
https://doi.org/10.1364/eul.1996.r54
Autor:
Andrew M. Hawryluk, Natale M. Ceglio
Publikováno v:
Extreme Ultraviolet Lithography.
The cost of fabricating state-of-the-art integrated circuits (ICs) has been increasing and it will likely be economic rather than technical factors that ultimately limit the progress of ICs toward smaller devices. It is estimated that lithography cur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13600bad689f04d49238df21ca423a97
https://doi.org/10.1364/eul.1994.elpm.13
https://doi.org/10.1364/eul.1994.elpm.13
Publikováno v:
Soft X-Ray Projection Lithography.
Present soft x-ray projection lithography systems rely on laser produced plasmas for the production of x-rays and on multilayer coated reflective masks. Target debris from the laser produced plasma can coat condenser optics and reduce system performa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2f698d8ecc2d6763006936c771703ea
https://doi.org/10.1364/sxray.1993.ma.6
https://doi.org/10.1364/sxray.1993.ma.6
Autor:
Natale M. Ceglio, Andrew M. Hawryluk
Publikováno v:
SPIE Proceedings.
A baseline model providing technical performance specifications and preliminary cost assessments for a prototype Soft X-ray Projection Lithography (SXPL) system is presented. We find that the technical performance requirements for components of the S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::278e83140c26ec2c0233e6ee0f1ac86a
https://doi.org/10.1117/12.51272
https://doi.org/10.1117/12.51272