Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Andrew J. Merriam"'
Autor:
Andrew J. Merriam, Alexei V. Sokolov
Publikováno v:
Physical Review A. 56:967-975
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f1f534fb863716939aef6e639097be2
https://doi.org/10.1103/physreva.56.967
https://doi.org/10.1103/physreva.56.967
Autor:
Andrew J. Merriam
Publikováno v:
Nonlinear Optics.
We have created a coherent vacuum ultraviolet light source that operates with ultra-narrow spectral bandwidth, and MHz repetition rates. The source is based on efficient gas-phase, single-sideband frequency-conversion of an infra-red fiber laser.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1ffbf7083b815c9efcf1dc04cdc96e7
https://doi.org/10.1364/nlo.2013.ntu3b.6
https://doi.org/10.1364/nlo.2013.ntu3b.6
Autor:
Zhongkai Liu, James Lee, Zhi-Xun Shen, Inna Vishik, Yu He, Alfred Zong, Robert C. Moore, Michael Jefferson, Shuolong Yang, Ming Yi, Sudi Chen, Andrew J. Merriam, Patrick S. Kirchmann, Slavko Rebec, D. Leuenberger
Publikováno v:
The Review of scientific instruments, vol 87, iss 1
He, Y; Vishik, IM; Yi, M; Yang, S; Liu, Z; Lee, JJ; et al.(2016). Invited Article: High resolution angle resolved photoemission with tabletop 11 eV laser. Review of Scientific Instruments, 87(1). doi: 10.1063/1.4939759. UC Davis: Retrieved from: http://www.escholarship.org/uc/item/63x139r6
He, Y; Vishik, IM; Yi, M; Yang, S; Liu, Z; Lee, JJ; et al.(2016). Invited Article: High resolution angle resolved photoemission with tabletop 11 eV laser. Review of Scientific Instruments, 87(1). doi: 10.1063/1.4939759. UC Davis: Retrieved from: http://www.escholarship.org/uc/item/63x139r6
© 2016 AIP Publishing LLC. We developed a table-top vacuum ultraviolet (VUV) laser with 113.778 nm wavelength (10.897 eV) and demonstrated its viability as a photon source for high resolution angle-resolved photoemission spectroscopy (ARPES). This s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::94a0b41901025a540af192ed0404fcbf
https://doi.org/10.1063/1.4939759
https://doi.org/10.1063/1.4939759
Publikováno v:
SPIE Proceedings.
We describe the design and performance of a high-peak-power, ns-pulsed, tunable OPO/OPA light source. The use of a volume Bragg grating output coupler in a 532-nm-pumped, singly-resonant KTP OPO provides stable, narrow-band (< 2-cm-1) and frequency-t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbcab2b8be4c5f453873f49cb50688ba
https://doi.org/10.1117/12.809405
https://doi.org/10.1117/12.809405
Autor:
William D. Hinsberg, Andrew J. Merriam, C. Michael Jefferson, John A. Hoffnagle, James J. Jacob, Donald S. Bethune, Timothy Litvin
Publikováno v:
SPIE Proceedings.
We have developed a solid-state 193-nm laser source operating at 5-kHz that generates a near-diffraction-limited TEM00 beam with 35 mW average power. The frequency spectrum is Gaussian, with a linewidth ~7-pm (FWHM), corresponding to a coherence leng
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85a38f8898270326569fee03be58d4a9
https://doi.org/10.1117/12.712210
https://doi.org/10.1117/12.712210
Publikováno v:
Advanced Solid-State Photonics.
We have developed a 5-kHz 193-nm laser source that generates a near-diffraction-limited TEM00 beam with 35 mW average power. The conversion efficiency and stability are both significantly enhanced by cooling the BBO sum-frequency mixing crystal.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a110dfa70b70579fd05fe5e0f3c0ed6a
https://doi.org/10.1364/assp.2007.mb11
https://doi.org/10.1364/assp.2007.mb11
Autor:
James J. Jacob, Andrew J. Merriam
Publikováno v:
SPIE Proceedings.
We describe an improved solid-state 193-nm laser source tailored specifically for high resolution photomask phase metrology. This source operates at a repetition rate of 5 kHz and produces 10-mW average power with a spectral bandwidth of 30 pm and ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8a6afbfcfa50d737ad27cd82bcf2a2e
https://doi.org/10.1117/12.632309
https://doi.org/10.1117/12.632309
Autor:
Andrew J. Merriam, James J. Jacob
Publikováno v:
AIP Conference Proceedings.
A variety of phase‐shifting photomask technologies are being developed to meet the challenges of sub‐0.3 k1, 193‐nm exposure wavelength photolithography. Each technology shares a common requirement for successful implementation: precise photoma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::857587c7461d991027c140cb945b3b48
https://doi.org/10.1063/1.2063004
https://doi.org/10.1063/1.2063004
Autor:
Douglas Van Den Broeke, J. Fung Chen, Bryan S. Kasprowicz, Andrew J. Merriam, Stephen Hsu, James J. Jacob
Publikováno v:
SPIE Proceedings.
The recent introduction of chromeless-phase lithography (CPL) has provided lithographers with a powerful wavefrontengineering tool for patterning at k 1 values below 0.3. Reliable image formation at such extreme k 1 requires a well-characterized CPL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb6e807c32ca528f89e10e544de52d07
https://doi.org/10.1117/12.569274
https://doi.org/10.1117/12.569274
Autor:
James J. Jacob, Andrew J. Merriam
Publikováno v:
SPIE Proceedings.
Attaining acceptable yields in the manufacture of advanced photomasks will require higher performance optical metrology tools. Key to improving these tools is the development of new ultraviolet light illumination sources that operate at the actinic w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6720c9c207db71955a99facab46a46c2
https://doi.org/10.1117/12.569428
https://doi.org/10.1117/12.569428