Zobrazeno 1 - 10
of 64
pro vyhledávání: '"Andrew Grenville"'
Publikováno v:
Pain Research and Management, Vol 1, Iss 4, Pp 215-218 (1996)
OBJECTIVE: To determine whether individuals in a population-based sample of migraine sufferers experience attacks that vary in intensity and in degree of disability, and to correlate any variability with age, sex, attack frequency and physician-consu
Externí odkaz:
https://doaj.org/article/311fe76c6a894b9da3c3dfdf96677605
Autor:
Peter De Schepper, Stephen T. Meyers, Alan J. Telecky, Amrit K. Narasimhan, Benjamin L. Clark, Andrew Grenville, Philippe Foubert, Shu Hao Chang, Jan Doise, Geert Vandenberghe, Yannick Feurprier, Poulomi Das, Danilo De Simone, Michael Kocsis, Christophe Beral, Jason K. Stowers, Onitsuka Tomoya
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
Inpria has pioneered the development of high-resolution metal oxide (MOx) photoresists designed to unlock the full potential of EUV lithography. In addition to resolution, LWR, and sensitivity to enable advanced process nodes, there are also stringen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb12a253b39e85382606c9a252e2079d
https://doi.org/10.1117/12.2584769
https://doi.org/10.1117/12.2584769
Autor:
Jason K. Stowers, Michael Kocsis, Benjamin L. Clark, Alan J. Telecky, Peter De Schepper, Andrew Grenville
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
In response to the growing demand for Inpria MOx EUV resists, we have brought online our high-volume manufacturing (HVM) production line, have built the necessary supporting qualified supply chain and have developed the associated quality systems. In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::143e4d479a365093896646b431b8b35c
https://doi.org/10.1117/12.2552894
https://doi.org/10.1117/12.2552894
Autor:
Reginald W. Bibby, Andrew Grenville
Publikováno v:
Canadian Review of Sociology/Revue canadienne de sociologie. 53:123-136
Over the past two decades or so, survey research findings on religious activities and beliefs have been confusing, with the results of researchers and private pollsters frequently differing from those of Statistics Canada. In this research note, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78de188b4513c4937313a708d10b5798
https://doi.org/10.1111/cars.12094
https://doi.org/10.1111/cars.12094
Autor:
Stephen T. Meyers, Jason K. Stowers, Michael Greer, Andrew Grenville, Craig D. Needham, Peter De Schepper, Michael Kocsis
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
The viability of EUV lithography depends upon the accurate placement of hundreds of billions of features per field with critical dimensions less than 30 nm using a minimal photon count. In this photon-limited regime, resist absorbance, radiochemical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f1c2490221efa2de196c98e7e3a4597
https://doi.org/10.1117/12.2299968
https://doi.org/10.1117/12.2299968
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS
This guest editorial introduces and summarizes the Special Section on EUV Lithography for the 3-nm Node and Beyond
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::22667be4f40c40bf794cace1fd5dcf42
Autor:
Kai Jiang, Benjamin L. Clark, Werner Gillijns, Edson Joseph B, Michael Greer, Peter De Schepper, Danilo De Simone, Stephen T. Meyers, Michael Kocsis, Jeremy T. Anderson, Geert Vandenberghe, Andrew Grenville, Alan J. Telecky, Brian Cardineau, Jason K. Stowers
Publikováno v:
SPIE Proceedings.
Inpria continues to leverage novel metal oxide materials to produce high resolution photoresists for EUV lithography with high optical density and etch resistance. Our resists have previously demonstrated 13nm line/space patterns at 35 mJ/cm2, with e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::248a2a8fdc82db1edcbe8b0d707f5a52
https://doi.org/10.1117/12.2219527
https://doi.org/10.1117/12.2219527
Autor:
Jason K. Stowers, Alex P. G. Robinson, Andrew Grenville, Andreas Frommhold, Roberto Fallica, Yasin Ekinci
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c1269115d6333cff334fa594d902cb8
https://doi.org/10.1117/12.2219193
https://doi.org/10.1117/12.2219193
Autor:
Peter De Schepper, Jason K. Stowers, Fumiko Yamashita, Geert Vandenberghe, Andrew Grenville, Danilo De Simone, Stephen T. Meyers, Vinh Luong, Benjamin L. Clark, Frederic Lazzarino, Michael Kocsis, Doni Parnell, Ming Mao
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
Inpria has developed a directly patternable metal oxide hard-mask as a robust, high-resolution photoresist for EUV lithography. In this paper we demonstrate the full integration of a baseline Inpria resist into an imec N7 BEOL block mask process modu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b64ec91a9dccc9328858ce4c82dcbc0
https://doi.org/10.1117/12.2220051
https://doi.org/10.1117/12.2220051
Autor:
Reginald W, Bibby, Andrew, Grenville
Publikováno v:
Canadian review of sociology = Revue canadienne de sociologie. 53(1)
Over the past two decades or so, survey research findings on religious activities and beliefs have been confusing, with the results of researchers and private pollsters frequently differing from those of Statistics Canada. In this research note, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::d48c072114fe0dd818b21a1fb68f89e4
https://pubmed.ncbi.nlm.nih.gov/26890449
https://pubmed.ncbi.nlm.nih.gov/26890449